The M2 Phase of Free-Standing Ga-Doped VO2 Single Crystals Over Wide Temperature Ranges

IF 2.8
Advanced Physics Research Pub Date : 2026-06-11 Epub Date: 2026-04-06 DOI:10.1002/apxr.202500235
Larisa Patlagan, Anna Eyal, Irena Feldman, George M. Reisner, Bertina Fisher
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Abstract

For more than six decades, VO2 has been one of the most impressive electronic materials due to its spectacular insulator metal transition (IMT) close to room temperature, accompanied by a structural transition and significant changes in optical properties which provided a list of potential applications such as electrical and optical switches, electrical and optical memories, smart windows, neural devices and thermal actuators. Despite a comprehensive investigation effort invested by scientists and engineers, as of today, there is no useful device on sale made of VO2. The main cause is cracks induced by the large strain-stress developed upon cycling through IMT of clamped samples. Another weakness is the high sensitivity of VO2 to foreign cations and deviations from oxygen stoichiometry, which may induce multiple coexisting phases. To become useful in device technology, the phase diagram of doped VO2 should be adjusted to provide a wide range of temperatures below IMT in which the material is single-phase and not under strain or stress induced by the substrate and contacts. Low- current R(T), DC, and pulsed I–V measurements conducted on free-standing Ga-doped VO2 single crystals provided encouraging results and proved the advantage of Ga over, e.g., Al doping.

Abstract Image

宽温度范围内独立的ga掺杂VO2单晶的M2相
六十多年来,VO2一直是最令人印象深刻的电子材料之一,因为它具有接近室温的壮观的绝缘体金属转变(IMT),伴随着结构转变和光学性质的重大变化,提供了一系列潜在的应用,如电气和光开关,电气和光存储器,智能窗口,神经装置和热致动器。尽管科学家和工程师进行了全面的调查,但到今天为止,市面上还没有一款有用的VO2设备。其主要原因是夹紧试样在IMT循环过程中产生的较大应变应力引起的裂纹。另一个缺点是VO2对外来阳离子的高敏感性和氧化学计量的偏差,这可能导致多个共存相。为了在器件技术中发挥作用,应该调整掺杂VO2的相图,以提供低于IMT的广泛温度范围,在该温度范围内材料是单相的,并且不会受到衬底和触点引起的应变或应力。在独立的Ga掺杂VO2单晶上进行的低电流R(T), DC和脉冲I-V测量提供了令人鼓舞的结果,并证明了Ga优于Al掺杂。
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