pH-Regulated precipitation synthesis of copper vanadate nanomaterials for enhanced photocatalytic degradation

IF 2.8 4区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Materials Science: Materials in Electronics Pub Date : 2026-05-09 DOI:10.1007/s10854-026-17415-5

Yanan Zhang, Junhe Zhang, Zhehao Cui, Yiming Gao, Yong Zhang, Lizhai Pei

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引用次数: 0

Abstract

Copper vanadate nanomaterials have attracted widespread attention as promising photocatalysts for the degradation of organic pollutants due to their narrow bandgap and efficient visible light absorption ability. In this study, copper vanadate nanosheets Cu₃V₂O₇(OH)₂·2H₂O were synthesized using a simple precipitation method and characterized by Fourier transform infrared spectroscopy, X-ray diffraction, scanning electron microscopy, and high-resolution transmission electron microscopy. The photocatalytic performance of Cu₃V₂O₇(OH)₂·2H₂O prepared under different pH conditions was evaluated through methylene blue degradation experiments using a xenon lamp under simulated solar-light irradiation. Results showed that Cu₃V₂O₇(OH)₂·2H₂O nanomaterials at pH = 12 exhibited high photocatalytic activity, achieving an MB degradation rate of 81%, with an apparent rate constant of 0.0140 min⁻¹, demonstrating their potential in wastewater treatment applications. Electrochemical impedance spectroscopy and zeta-potential analyses showed that the pH = 12 sample possessed improved interfacial charge-transfer behavior and favorable surface charge characteristics. Catalyst-dosage and MB-concentration gradient experiments identified 50 mg as the optimum catalyst dosage, while higher initial MB concentration reduced the degradation efficiency. After five successive cycles, the degradation efficiency decreased by only 9%, indicating good reusability and cycling stability. To further investigate the photocatalytic mechanism, various free radical scavengers were employed to identify the key reactive species involved in the degradation process. Hydroxyl radicals (·OH) and photogenerated holes (h⁺) played a crucial role in the degradation of methylene blue. Kinetic analysis of the photocatalytic reaction indicated that the degradation of methylene blue followed a pseudo-first-order kinetic model. These results indicate that Cu₃V₂O₇(OH)₂·2H₂O can serve as an efficient and environmentally friendly photocatalyst for organic pollutant degradation, providing a promising strategy for wastewater treatment.

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ph调节沉淀法合成钒酸铜纳米材料增强光催化降解

钒酸铜纳米材料由于其窄带隙和高效的可见光吸收能力，作为降解有机污染物的光催化剂受到了广泛的关注。本研究采用简单沉淀法合成了钒酸铜纳米片Cu3V2O7(OH)2·2H2O，并用傅里叶变换红外光谱、x射线衍射、扫描电镜和高分辨率透射电镜对其进行了表征。通过模拟太阳光照下氙灯降解亚甲基蓝实验，评价了不同pH条件下制备的Cu3V2O7(OH)2·2H2O的光催化性能。结果表明，Cu3V2O7(OH)2·2H2O纳米材料在pH = 12时表现出较高的光催化活性，对MB的降解率达到81%，表观速率常数为0.0140 min−1，显示了其在废水处理中的应用潜力。电化学阻抗谱和ζ电位分析表明，pH = 12的样品具有更好的界面电荷转移行为和良好的表面电荷特性。催化剂投加量和MB浓度梯度实验表明，最佳投加量为50 mg，初始MB浓度越高，降解效率越低。连续循环5次后，降解效率仅下降9%，表明其具有良好的可重复使用性和循环稳定性。为了进一步研究光催化机理，研究人员利用各种自由基清除剂来鉴定参与降解过程的关键活性物质。羟基自由基（·OH）和光生空穴（h+）在亚甲基蓝的降解中起着至关重要的作用。光催化反应的动力学分析表明，亚甲基蓝的降解符合准一级动力学模型。这些结果表明，Cu3V2O7(OH)2·2H2O可以作为一种高效、环保的光催化剂降解有机污染物，为废水处理提供了一种有前景的策略。

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来源期刊

Journal of Materials Science: Materials in Electronics 工程技术-材料科学：综合

CiteScore

5.00

自引率

7.10%

发文量

1931

审稿时长

2 months

期刊介绍： The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.