Performance and sensitivity analysis of dielectric engineered GAA-JL MOSFET for chloroform gas detection

IF 4 Q2 NANOSCIENCE & NANOTECHNOLOGY
Abhinav Gupta, Akanksha Gupta, Suman Lata Tripathi, Manish Kumar Rai
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引用次数: 0

Abstract

This paper demonstrates a simulation-based analysis of highly sensitive gas sensor design to detect the Chloroform gas based on an advanced Gate All Around Junctionless MOSFET (GAA-JLMOS). In this design, traditional polysilicon gate is replaced with Iridium-Rhodium/Palladium nano-composite (Ir-Rh/Pd) which is responsible for a linear shift in gate work-function in presence of chloroform gas. The work-function modification results into the changes in drain current (Id) and threshold voltage (Vth), showing a reliable detection from no gas to 50 ppm CHCl3concentrations by MOS sensor. Additionally, the subthreshold swing optimization leads to faster switching and response times. The simulation results showa significant improvement in the sensitivity of proposed sensor compared to conventional MOS based designs. This manuscript proposes better selectivity towards the detection of chloroform vapors compared to the existing MOS based gas sensors. The simulation results meet a 2x times increase in threshold voltage and 100x times reduction in the leakage current from no gas to 50 ppm concentration of CHCl3. The proposed GAA-JLMOS shows high sensitivity, low leakage current, and enhanced scalability, providing a possible pathway toward next-generation nanoscale gas sensors. An ATLAS 3D TCAD simulator is used for the sensor design and simulations.

用于氯仿气体检测的介电工程GAA-JL MOSFET性能及灵敏度分析
本文演示了一种基于先进的栅极无结MOSFET (GAA-JLMOS)的高灵敏度气体传感器设计,用于检测氯仿气体。在这个设计中,传统的多晶硅栅极被铱铑/钯纳米复合材料(Ir-Rh/Pd)所取代,该材料在氯仿气体存在下负责栅极工作功能的线性移位。工作函数的修改导致漏极电流(Id)和阈值电压(Vth)的变化,表明MOS传感器在无气体到50 ppm chcl3浓度范围内可以可靠地检测。此外,亚阈值摆动优化导致更快的切换和响应时间。仿真结果表明,与传统的MOS传感器相比,该传感器的灵敏度有了显著提高。与现有的MOS气体传感器相比,本文提出了对氯仿蒸汽检测的更好选择性。仿真结果表明,当CHCl3浓度为50 ppm时,无气体时,阈值电压提高2倍,泄漏电流降低100倍。所提出的GAA-JLMOS具有高灵敏度、低漏电流和增强的可扩展性,为下一代纳米级气体传感器提供了可能的途径。利用ATLAS三维TCAD模拟器对传感器进行设计和仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Micro and Nano Systems Letters
Micro and Nano Systems Letters Engineering-Biomedical Engineering
CiteScore
10.60
自引率
5.60%
发文量
16
审稿时长
13 weeks
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