First-principles calculations on the electronic structure of Co-doped diamond

IF 4.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Vacuum Pub Date : 2026-03-01 Epub Date: 2025-12-18 DOI:10.1016/j.vacuum.2025.115031
Meng Gao , Youchen Sun , Aqing Chen , Jun Zhang
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引用次数: 0

Abstract

Doping behavior of Cobalt (Co) in diamond was investigated by using density functional theory (DFT). Formation energies, work functions, and charge distributions were calculated for Co atoms substituted at different depths in the (111) and (220) planes. The results show that Co incorporation is energetically favorable in the shallow layers of both surfaces, but becomes progressively less stable at greater depths. On both crystal planes, Co doping reduces the work function by approximately 0.25 eV, suggesting enhanced electron emission and higher surface reactivity. Charge density analysis further reveals significant electron transfer between Co and neighboring carbon atoms, forming mixed covalent-ionic bonds and inducing local lattice distortions. These electronic and structural modifications highlight the potential of Co-doped diamond as a tunable material for catalytic and electronic applications. The findings provide theoretical guidance for future experimental studies aimed at exploiting transition-metal doping to tailor diamond's functional properties.
共掺杂金刚石电子结构的第一性原理计算
利用密度泛函理论(DFT)研究了钴在金刚石中的掺杂行为。计算了Co原子在(111)和(220)平面上不同深度取代的形成能、功函数和电荷分布。结果表明,Co的掺入在两个表面的浅层中都是有利的,但在更深的层中变得越来越不稳定。在两个晶体平面上,Co掺杂使功函数降低了约0.25 eV,表明电子发射增强,表面反应性提高。电荷密度分析进一步揭示了Co和相邻碳原子之间的显著电子转移,形成混合的共价键和离子键,并诱导局部晶格畸变。这些电子和结构修饰突出了共掺杂金刚石作为催化和电子应用的可调材料的潜力。这一发现为未来的实验研究提供了理论指导,旨在利用过渡金属掺杂来定制金刚石的功能特性。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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