Evaluation of the robustness of the defect-centric model for defect parameter extraction from RTN and BTI analysis using Comphy

IF 3.3 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Microelectronic Engineering Pub Date : 2026-03-01 Epub Date: 2025-12-05 DOI:10.1016/j.mee.2025.112436
Martin E.M. Loesener , Tobias Zinsler , Bernhard Stampfer , Florian Wimmer , Eleftherios Ioannidis , Walter Pflanzl , Rainer Minixhofer , Tibor Grasser , Michael Waltl
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引用次数: 0

Abstract

Advanced reliability simulators like Comphy capture much of the state-of-the-art modeling behind charge trapping processes. An alternative approach to Comphy is to apply stochastic models, e.g. the defect-centric model, directly to the experimental data to extract the impact of defects on the device behavior and trap densities. In order to efficiently design defect characterization experiments, however, it is of utmost importance to understand the robustness of the defect-centric model under a variety of pre-conditions. In this work, we evaluate the requirements to employ the defect-centric model for data analysis, using simulated data from Comphy based on a real 400 nm × 180 nm pMOS device. Our results show that the number of devices from wafer-level tests does not suffice for statistical evaluation of RTN analysis. Here, preferably array chips should be used. For BTI studies, both wafer-level and array-chip tests enable us to extract good estimates for defect parameters with little computational effort.

Abstract Image

缺陷中心模型在RTN和BTI分析中缺陷参数提取的鲁棒性评价
像Comphy这样的高级可靠性模拟器可以捕获电荷捕获过程背后的许多最先进的模型。Comphy的另一种方法是将随机模型(例如以缺陷为中心的模型)直接应用于实验数据,以提取缺陷对器件行为和陷阱密度的影响。然而,为了有效地设计缺陷表征实验,了解以缺陷为中心的模型在各种前提条件下的鲁棒性至关重要。在这项工作中,我们评估了采用以缺陷为中心的模型进行数据分析的需求,使用了基于真实400 nm × 180 nm pMOS器件的Comphy模拟数据。我们的研究结果表明,晶圆级测试的器件数量不足以对RTN分析进行统计评估。在这里,最好使用阵列芯片。对于BTI研究,晶圆级和阵列芯片测试都使我们能够以很少的计算量提取出良好的缺陷参数估计。
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来源期刊
Microelectronic Engineering
Microelectronic Engineering 工程技术-工程:电子与电气
CiteScore
5.30
自引率
4.30%
发文量
131
审稿时长
29 days
期刊介绍: Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.
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