Dynamic image blurring analysis and vibration suppression in reflective lithography projection objective

IF 4.5 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Shiyu Li , Ji Zhou , Chi Tu , Xia Kang , Jingteng Liu , Haifeng Sun , Junbo Liu
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引用次数: 0

Abstract

Dynamic image degradation in reflective projection objectives limits sub-nanometer chip fabrication in high-numerical aperture (NA) extreme ultraviolet (EUV) lithography systems. Micro-vibrations induce optical misalignments via opto-mechanical coupling, causing spatial image blur. An opto-mechanical coupled model and a multi-parameter optimization method are proposed to evaluate the mirror position offset and reduce the vibration response. Based on the second Lagrange equations, a multi-body dynamics model considering the internal stiffness, damping and mass of the objective is established. The predicted mirror displacement errors along the X, Y and Z axes are 3.01 %, 3.39 % and 0.12 % respectively. Hopkins’ partially coherent imaging theory and wavefront aberration transfer functions are used to develop a dynamic image blur evaluation model. On this basis, a hybrid genetic algorithm-particle swarm optimization (GA-PSO) method is proposed to optimize stiffness and damping parameters, reducing mirror displacement responses and spatial image pattern errors (PE) by over 36 % and 40 % respectively.
反射式光刻投影物镜动态图像模糊分析及振动抑制
在高数值孔径极紫外光刻系统中,反射投影物镜的动态图像退化限制了亚纳米芯片的制造。微振动通过光-机械耦合引起光学失调,造成空间图像模糊。提出了一种光-机耦合模型和多参数优化方法来评估反射镜的位置偏移并减小振动响应。基于第二拉格朗日方程,建立了考虑目标体内部刚度、阻尼和质量的多体动力学模型。预测的X、Y、Z轴镜面位移误差分别为3.01%、3.39%和0.12%。利用Hopkins的部分相干成像理论和波前像差传递函数建立了动态图像模糊评价模型。在此基础上,提出了一种混合遗传算法-粒子群优化(GA-PSO)方法来优化刚度和阻尼参数,将镜面位移响应和空间图像模式误差(PE)分别降低了36%和40%以上。
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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