Shiyu Li , Ji Zhou , Chi Tu , Xia Kang , Jingteng Liu , Haifeng Sun , Junbo Liu
{"title":"Dynamic image blurring analysis and vibration suppression in reflective lithography projection objective","authors":"Shiyu Li , Ji Zhou , Chi Tu , Xia Kang , Jingteng Liu , Haifeng Sun , Junbo Liu","doi":"10.1016/j.precisioneng.2025.12.003","DOIUrl":null,"url":null,"abstract":"<div><div>Dynamic image degradation in reflective projection objectives limits sub-nanometer chip fabrication in high-numerical aperture (NA) extreme ultraviolet (EUV) lithography systems. Micro-vibrations induce optical misalignments via opto-mechanical coupling, causing spatial image blur. An opto-mechanical coupled model and a multi-parameter optimization method are proposed to evaluate the mirror position offset and reduce the vibration response. Based on the second Lagrange equations, a multi-body dynamics model considering the internal stiffness, damping and mass of the objective is established. The predicted mirror displacement errors along the X, Y and Z axes are 3.01 %, 3.39 % and 0.12 % respectively. Hopkins’ partially coherent imaging theory and wavefront aberration transfer functions are used to develop a dynamic image blur evaluation model. On this basis, a hybrid genetic algorithm-particle swarm optimization (GA-PSO) method is proposed to optimize stiffness and damping parameters, reducing mirror displacement responses and spatial image pattern errors (PE) by over 36 % and 40 % respectively.</div></div>","PeriodicalId":54589,"journal":{"name":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","volume":"98 ","pages":"Pages 96-107"},"PeriodicalIF":4.5000,"publicationDate":"2026-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0141635925003617","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/12/2 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0
Abstract
Dynamic image degradation in reflective projection objectives limits sub-nanometer chip fabrication in high-numerical aperture (NA) extreme ultraviolet (EUV) lithography systems. Micro-vibrations induce optical misalignments via opto-mechanical coupling, causing spatial image blur. An opto-mechanical coupled model and a multi-parameter optimization method are proposed to evaluate the mirror position offset and reduce the vibration response. Based on the second Lagrange equations, a multi-body dynamics model considering the internal stiffness, damping and mass of the objective is established. The predicted mirror displacement errors along the X, Y and Z axes are 3.01 %, 3.39 % and 0.12 % respectively. Hopkins’ partially coherent imaging theory and wavefront aberration transfer functions are used to develop a dynamic image blur evaluation model. On this basis, a hybrid genetic algorithm-particle swarm optimization (GA-PSO) method is proposed to optimize stiffness and damping parameters, reducing mirror displacement responses and spatial image pattern errors (PE) by over 36 % and 40 % respectively.
期刊介绍:
Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.