Study on the twinning in LEC-GaSb crystals

IF 2.5 4区 材料科学 Q3 CRYSTALLOGRAPHY
Journal of Crystal Growth Pub Date : 2026-02-01 Epub Date: 2025-11-29 DOI:10.1016/j.jcrysgro.2025.128448
Weimin Dong , Henghao Feng , Xin Zhao , Linwei Song , Jin Yang , Dazheng Deng , Yingjie Sun , Biwen Duan , Shufen Li , Deliang Chu , Qianwen Peng , Yumin Li , Jincheng Kong , Jun Zhao
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引用次数: 0

Abstract

Twinning is a critical factor limiting the size and yield of III-V semiconductor single crystals. In this work, the < 100 > GaSb crystals were grown by the liquid-encapsulated Czochralski (LEC) method, and the influences of dislocations and {111} facets on twinning were studied. During the seeding and shouldering, the low-angle grain boundaries resulting from dislocation multiplication typically induce twinning or polycrystallization. Moreover, when growing < 100 > GaSb crystals, twinning tends to occur preferentially on the (1¯1¯1¯)Sb plane. First-principles calculations revealed that the stacking fault energy (SFE) of the (1¯1¯1¯)Sb plane (25.36 mJ/m2) is much smaller than that of the (111)Ga plane (54.25 mJ/m2), indicating a higher propensity for twin nucleation on the (1¯1¯1¯)Sb plane, thereby confirming the experimental observations. The experimental results show that at the solid–liquid growth interface, the supercooling(ΔT) near the (1¯1¯1¯)Sb plane is significantly higher than on the (111)Ga plane, which leads to a considerably greater probability of twinning nucleation occurring on the (1¯1¯1¯)Sb plane. The abrupt increase in ΔT caused by local temperature fluctuations may be the primary reason for twinning in < 100 > GaSb crystals.
LEC-GaSb晶体孪晶的研究
孪生是限制III-V型半导体单晶尺寸和产率的关键因素。本文采用液包法制备了<; 100 >; GaSb晶体,研究了位错和{111}刻面对晶体孪晶的影响。在播种和肩化过程中,由位错增殖产生的低角度晶界通常会诱发孪晶或多晶。此外,当生长<; 100 >; GaSb晶体时,孪晶倾向于优先发生在(1¯1¯1¯)Sb平面上。第一原理计算表明(1¯1¯1¯)Sb平面的层错能(25.36 mJ/m2)远小于(111)Ga平面的层错能(54.25 mJ/m2),表明(1¯1¯1¯)Sb平面更倾向于双核,从而证实了实验观测结果。实验结果表明,在固液生长界面处,(1¯1¯1¯)Sb平面附近的过冷度(ΔT)明显高于(111)Ga平面,这导致(1¯1¯1¯)Sb平面上出现孪生成核的概率显著增大。局地温度波动引起的ΔT的突然增加可能是导致<; 100 >; GaSb晶体孪晶的主要原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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