Development of electron ptychography from algorithms, detectors to its applications

Q3 Immunology and Microbiology
Wonwoo Suh, Jeewon B. Choi, Keun-Yeol Park, Celesta S. Chang
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引用次数: 0

Abstract

Electron ptychography has emerged as a powerful computational imaging technique using four-dimensional scanning transmission electron microscopy, greatly exceeding the resolution limits of conventional electron microscopes by quantitative phase retrieval. This paper presents recent algorithmic developments and technological requirements for detectors used in electron ptychography, as well as applications in different fields of nanoscience. The application range covers high-resolution imaging of beam-sensitive specimens, light element detection, and three-dimensional reconstruction, making electron ptychography a versatile technique for materials characterization.

从算法、检测器到应用的电子印刷技术的发展。
电子型图已经成为一种强大的计算成像技术,利用四维扫描透射电子显微镜,大大超过了传统电子显微镜定量相位检索的分辨率限制。本文介绍了用于电子型图的探测器的最新算法发展和技术要求,以及它们在纳米科学不同领域的应用。应用范围涵盖光束敏感样品的高分辨率成像,光元素检测和三维重建,使电子型图成为材料表征的通用技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Applied Microscopy
Applied Microscopy Immunology and Microbiology-Applied Microbiology and Biotechnology
CiteScore
3.40
自引率
0.00%
发文量
10
审稿时长
10 weeks
期刊介绍: Applied Microscopy is a peer-reviewed journal sponsored by the Korean Society of Microscopy. The journal covers all the interdisciplinary fields of technological developments in new microscopy methods and instrumentation and their applications to biological or materials science for determining structure and chemistry. ISSN: 22875123, 22874445.
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