Single-dopant long-range stabilization in long-cycled Li-rich layered cathodes via trace tetrahedral-site doping

IF 52.9 Q1 ELECTROCHEMISTRY
eScience Pub Date : 2025-11-01 Epub Date: 2025-04-03 DOI:10.1016/j.esci.2025.100406
Haoxiang Sun , Youxuan Ni , Xinyao Wu , Dongjie Shi , Zhenhua Yan , Kai Zhang , Fangyi Cheng , Weiwei Xie , Wei Zhang , Jun Chen
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Abstract

Migration of transition metal (TM) ions out of the TM layer is detrimental and unavoidable in lithium-rich layered oxides, which drives in-plane cation migration, O2 release and energy loss. Since out-of-plane migration generally occurs through tetrahedral interstices (TLi) in the Li layer, doping TLi sites has been believed as a promising way to block migration pathways at the dopant site. However, with only trace dopants (<1 ​at.%) sparsely distributed in bulk, the ability of isolated dopants to suppress cation disorder in undoped regions remains unknown—largely due to no suitable model materials. Here, combining atomic-scale imaging, X-ray diffraction measurements and first-principles calculations, we demonstrate that W6+ ions (0.75 ​at.%) can occupy TLi sites in Li1·2Mn0·6Ni0·2O2. TLi-site doping maximizes dopant efficiency, as each single W6+ ion exerts a long-range Coulomb repulsion on TM/Li+ ions in the TM layer, suppressing both in-plane and out-of-plane cation migration over a broad range (∼2 ​nm diameter), in contrast to local stabilization via other doping techniques. Remarkably, cation ordering is preserved for over 250 cycles, far exceeding the limited structural stability (∼50 cycles) typically achieved with conventional modification strategies. Consequently, O2 release and formation of low-voltage Mn3+/Mn4+ redox couple are inhibited, resulting in negligible voltage decay.

Abstract Image

通过痕量四面体位掺杂实现长循环富锂层状阴极的单掺杂远距离稳定
在富锂层状氧化物中,过渡金属(TM)离子从TM层中迁移是有害的,也是不可避免的,这会导致平面内阳离子迁移、O2释放和能量损失。由于平面外迁移通常通过Li层中的四面体间隙(TLi)进行,因此掺杂TLi位点被认为是阻断掺杂位点迁移途径的一种有前途的方法。然而,只有微量掺杂剂(<1 at。%)稀疏分布的大块,分离的掺杂剂抑制未掺杂区域阳离子无序的能力仍然未知,主要是因为没有合适的模型材料。在这里,结合原子尺度成像,x射线衍射测量和第一性原理计算,我们证明了W6+离子(0.75 at。%)可以占据Li1·2Mn0·6Ni0·2O2中的TLi位点。与其他掺杂技术的局部稳定相比,TLi-site掺杂可以最大限度地提高掺杂效率,因为每个W6+离子对TM层中的TM/Li+离子施加远程库仑斥力,从而在宽范围(~ 2 nm直径)内抑制面内和面外阳离子的迁移。值得注意的是,阳离子有序保持超过250个循环,远远超过传统修饰策略通常实现的有限结构稳定性(~ 50个循环)。因此,O2的释放和低压Mn3+/Mn4+氧化还原对的形成被抑制,导致电压衰减可以忽略不计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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CiteScore
33.70
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