Strain-mediated rapid growth of vertically oriented 2D MoSe₂: Insights into the growth mechanism

IF 5.7 3区 材料科学 Q2 CHEMISTRY, PHYSICAL
FlatChem Pub Date : 2025-11-01 Epub Date: 2025-10-23 DOI:10.1016/j.flatc.2025.100963
Rohit Kumar , Shreya Chandravanshi , Rejaul Ali , Subhashis Gangopadhyay , Arnab Hazra
{"title":"Strain-mediated rapid growth of vertically oriented 2D MoSe₂: Insights into the growth mechanism","authors":"Rohit Kumar ,&nbsp;Shreya Chandravanshi ,&nbsp;Rejaul Ali ,&nbsp;Subhashis Gangopadhyay ,&nbsp;Arnab Hazra","doi":"10.1016/j.flatc.2025.100963","DOIUrl":null,"url":null,"abstract":"<div><div>Horizontally aligned transition metal dichalcogenides (TMDCs) are well-suited for charge transport applications, while vertically oriented TMDCs are advantageous for high surface area applications such as catalysis, water splitting, and energy storage. However, the mechanism governing these structural and morphological transition remains unclear. This study provides a comprehensive growth time profile and demonstrates that parameters such as strain, distribution of grain boundaries, randomness and interlayer distance plays the critical role in driving the desirable morphological evolution. Here, we investigate the growth dynamics of MoSe₂ thin films synthesized via chemical vapor deposition (CVD), with a focus on understanding and optimizing the horizontal-to-vertical transition as a function of growth time. Scanning electron microscopy and high-resolution transmission electron microscopy (HRTEM) were used to trace the stacking and structural order, while Raman spectroscopy and photoluminescence spectroscopy (PL) were used to investigate the variation of stacking and optical order. X-ray photoelectron spectroscopy (XPS) was used to investigate the chemical environment of the films, and field-effect transistors (FET) measurements were used to assess electrical properties such as mobility and surface carrier density. To support the experimental findings, a computational multilayer stacking framework was developed to project desirable randomness in a controlled manner through the variation of interlayer distance and simulating extent of strain mediation through wide range of unstrained, compressive, tensile and even highly diffusive strain states. This model helps to establish the relationship between the interlayer distortion and randomness with the optical asymmetry, providing insights into strain-mediated widely distributed direct to indirect optical transitions. This can further serve as an optical marker especially for these highly randomized directional vertical oriented flakes. Overall, this study presents a fundamental understanding of strain-induced morphological transitions in MoSe₂ thin films and offers a framework for tracing and tuning the optical and electronic properties in anisotropic 2D materials.</div></div>","PeriodicalId":316,"journal":{"name":"FlatChem","volume":"54 ","pages":"Article 100963"},"PeriodicalIF":5.7000,"publicationDate":"2025-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"FlatChem","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2452262725001576","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/10/23 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

Abstract

Horizontally aligned transition metal dichalcogenides (TMDCs) are well-suited for charge transport applications, while vertically oriented TMDCs are advantageous for high surface area applications such as catalysis, water splitting, and energy storage. However, the mechanism governing these structural and morphological transition remains unclear. This study provides a comprehensive growth time profile and demonstrates that parameters such as strain, distribution of grain boundaries, randomness and interlayer distance plays the critical role in driving the desirable morphological evolution. Here, we investigate the growth dynamics of MoSe₂ thin films synthesized via chemical vapor deposition (CVD), with a focus on understanding and optimizing the horizontal-to-vertical transition as a function of growth time. Scanning electron microscopy and high-resolution transmission electron microscopy (HRTEM) were used to trace the stacking and structural order, while Raman spectroscopy and photoluminescence spectroscopy (PL) were used to investigate the variation of stacking and optical order. X-ray photoelectron spectroscopy (XPS) was used to investigate the chemical environment of the films, and field-effect transistors (FET) measurements were used to assess electrical properties such as mobility and surface carrier density. To support the experimental findings, a computational multilayer stacking framework was developed to project desirable randomness in a controlled manner through the variation of interlayer distance and simulating extent of strain mediation through wide range of unstrained, compressive, tensile and even highly diffusive strain states. This model helps to establish the relationship between the interlayer distortion and randomness with the optical asymmetry, providing insights into strain-mediated widely distributed direct to indirect optical transitions. This can further serve as an optical marker especially for these highly randomized directional vertical oriented flakes. Overall, this study presents a fundamental understanding of strain-induced morphological transitions in MoSe₂ thin films and offers a framework for tracing and tuning the optical and electronic properties in anisotropic 2D materials.

Abstract Image

应变介导的垂直定向二维MoSe 2的快速生长:生长机制的见解
水平取向的过渡金属二硫族化合物(TMDCs)非常适合于电荷传输应用,而垂直取向的TMDCs则有利于高表面积应用,如催化、水分解和能量储存。然而,控制这些结构和形态转变的机制尚不清楚。该研究提供了一个全面的生长时间曲线,并表明应变、晶界分布、随机性和层间距离等参数在驱动理想的形态演变中起着关键作用。在这里,我们研究了化学气相沉积(CVD)合成的MoSe 2薄膜的生长动力学,重点是了解和优化水平到垂直的转变作为生长时间的函数。利用扫描电镜(sem)和高分辨率透射电镜(HRTEM)跟踪材料的层序和结构,利用拉曼光谱(Raman spectroscopy)和光致发光光谱(PL)研究材料的层序和结构变化。x射线光电子能谱(XPS)用于研究薄膜的化学环境,场效应晶体管(FET)测量用于评估电学性能,如迁移率和表面载流子密度。为了支持实验结果,开发了一种计算多层堆叠框架,通过层间距离的变化以可控的方式投射理想的随机性,并在大范围的非应变、压缩、拉伸甚至高扩散应变状态下模拟应变中介的程度。该模型有助于建立层间畸变和随机性与光学不对称之间的关系,提供了对应变介导的广泛分布的直接到间接光学跃迁的见解。这可以进一步作为光学标记,特别是对于这些高度随机定向垂直取向的薄片。总的来说,本研究提供了对MoSe₂薄膜中应变诱导的形态转变的基本理解,并为追踪和调整各向异性二维材料的光学和电子特性提供了框架。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
FlatChem
FlatChem Multiple-
CiteScore
8.40
自引率
6.50%
发文量
104
审稿时长
26 days
期刊介绍: FlatChem - Chemistry of Flat Materials, a new voice in the community, publishes original and significant, cutting-edge research related to the chemistry of graphene and related 2D & layered materials. The overall aim of the journal is to combine the chemistry and applications of these materials, where the submission of communications, full papers, and concepts should contain chemistry in a materials context, which can be both experimental and/or theoretical. In addition to original research articles, FlatChem also offers reviews, minireviews, highlights and perspectives on the future of this research area with the scientific leaders in fields related to Flat Materials. Topics of interest include, but are not limited to, the following: -Design, synthesis, applications and investigation of graphene, graphene related materials and other 2D & layered materials (for example Silicene, Germanene, Phosphorene, MXenes, Boron nitride, Transition metal dichalcogenides) -Characterization of these materials using all forms of spectroscopy and microscopy techniques -Chemical modification or functionalization and dispersion of these materials, as well as interactions with other materials -Exploring the surface chemistry of these materials for applications in: Sensors or detectors in electrochemical/Lab on a Chip devices, Composite materials, Membranes, Environment technology, Catalysis for energy storage and conversion (for example fuel cells, supercapacitors, batteries, hydrogen storage), Biomedical technology (drug delivery, biosensing, bioimaging)
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信
小红书