Cerium Oxide Nanoparticles Embedded with Carbon Matrix for a Digital-Analog Integrated Memristor.

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Priyanka Sahu,Himadri Nandan Mohanty,Suman Roy,Smrutirekha Sahoo,Rajanigandha Barik,Alok Kumar,Ashis Kumar Panigrahi,Roshan Padhan,Dibakar Sahoo,Satyaprakash Sahoo
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Abstract

The integration of digital and analog resistive switching (RS) within a single device holds significant promise for multifunctional memory and neuromorphic computing applications. In this work, we present a CeO2-rGO nanocomposite-based memristor exhibiting bipolar RS behavior. The active layer, synthesized via a hydrothermal method, leverages the high oxygen vacancy concentration of CeO2 and the excellent conductivity of rGO to achieve a relatively low voltage, forming free switching with an enhanced device stability. The fabricated CeO2-rGO memristor device shows a large memory window and reliable endurance and retention time. Importantly, the coexistence of both digital and analog switching enables multilevel conductance states, essential for high-density storage and synaptic emulation. The possible mechanism for the presence of both switching behaviors is addressed by considering cation migration and oxygen vacancy redistribution. Additionally, the device exhibits a voltage pulse response during read-write-erase cycles for rewritable memory operations. These findings indicate CeO2-rGO nanocomposites could be a potential candidate for next-generation nonvolatile memory devices that bridge conventional data storage and neuromorphic functionalities.
嵌入碳基体的氧化铈纳米颗粒用于数模集成忆阻器。
数字和模拟电阻开关(RS)在单一器件中的集成为多功能记忆和神经形态计算应用提供了重要的前景。在这项工作中,我们提出了一种基于CeO2-rGO纳米复合材料的具有双极RS行为的记忆电阻器。通过水热法合成的活性层利用了CeO2的高氧空位浓度和rGO的优异导电性,实现了相对较低的电压,形成了自由开关,增强了器件的稳定性。所制备的氧化铈还原氧化石墨烯忆阻器具有较大的记忆窗口和可靠的持久时间和保持时间。重要的是,数字和模拟开关的共存可以实现多电平电导状态,这对于高密度存储和突触模拟至关重要。通过考虑阳离子迁移和氧空位再分配来解决这两种开关行为存在的可能机制。此外,该器件在可重写存储器操作的读-写-擦除周期期间显示电压脉冲响应。这些发现表明,CeO2-rGO纳米复合材料可能是下一代非易失性存储器件的潜在候选者,可以桥接传统的数据存储和神经形态功能。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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