Proton-Resistant Quantum Dots by Ligands.

IF 16 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-10-22 DOI:10.1021/acsnano.5c14377
Xia Zong, Meixin Liu, Xinran Xu, Fei Ding, Ling-Ling Yang, Wei Zhao, Haohao Fu, An-An Liu, Dai-Wen Pang
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引用次数: 0

Abstract

Quantum dots (QDs) are widely recognized for their exceptional optical and electronic properties, rendering them valuable for diverse applications. However, the surface structure significantly influences their photoluminescence performance, particularly under acidic conditions, where protons can induce QD aggregation and fluorescence quenching. Herein, we propose a strategy relying solely on elaborate ligand engineering to construct proton-resistant QDs, eliminating the need for multilayer bulky coatings. Proton-resistant Ag2Se QDs have been achieved by a synergistic proton defense mechanism: electrostatic shielding and proton trapping. Specifically, introducing surface ligands with groups that become highly positively charged upon protonation (e.g., amino groups) and employing solvents with low dielectric constants (e.g., ethylene glycol) enhances electrostatic shielding. Furthermore, incorporating abundant hydrogen-bond donors/acceptors into the ligand structure promotes the formation of hydrogen-bonding networks that trap penetrating protons. This hierarchical proton defense, realized purely via precisely designed ligands, enables modified GSH-capped Ag2Se QDs to retain stable fluorescence at proton concentrations up to 0.8 mol/L, exhibiting a four-orders-of-magnitude enhancement in proton tolerance compared to conventional mercaptopropionic acid-capped QDs. This work provides a universal paradigm for designing proton-resistant QDs and advances nanomaterial engineering for harsh environments.

配体抗质子量子点。
量子点(QDs)因其独特的光学和电子特性而被广泛认可,使其具有多种应用价值。然而,表面结构显著影响其光致发光性能,特别是在酸性条件下,质子可以诱导QD聚集和荧光猝灭。在此,我们提出了一种仅依赖于精细配体工程来构建抗质子量子点的策略,从而消除了多层笨重涂层的需要。抗质子Ag2Se量子点是通过静电屏蔽和质子俘获的协同质子防御机制实现的。具体来说,引入带有质子化后带高正电荷基团的表面配体(例如氨基)和使用具有低介电常数的溶剂(例如乙二醇)可以增强静电屏蔽。此外,在配体结构中加入丰富的氢键供体/受体可以促进氢键网络的形成,从而捕获穿透质子。这种分层质子防御完全通过精确设计的配体实现,使修饰的gsh覆盖的Ag2Se量子点在质子浓度高达0.8 mol/L时保持稳定的荧光,与传统的巯基丙酸覆盖的量子点相比,质子耐受性提高了4个数量级。这项工作为设计抗质子量子点提供了一个通用范例,并推动了恶劣环境下的纳米材料工程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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