Low-Cost Maskless Photolithography Using an LCD-3D Printer for Microelectronic Devices.

Abstract

A cost-effective and flexible approach is presented to maskless photolithography using a commercial Liquid Crystal Display (LCD)-based Masked Stereolithography Apparatus (MSLA) 3D printer. This method enables rapid and flexible patterning of photoresist-coated silicon wafers without the need for traditional photomasks, as well as the fabrication of large-area wafer-scale electrode arrays, offering a highly accessible alternative for microdevice fabrication. The process achieves spatial resolution approaching 20 µm and is demonstrated in the fabrication of gold electrodes for two-dimensional (2D) material-based transistors. The electrodes are used to integrate MoS₂ flakes, transferred via an all-dry deterministic method to fabricate field effect transistors and photodetectors. The results confirm that LCD-based lithography can produce high-quality devices comparable to those fabricated with conventional photolithography equipment, making it an attractive solution for low-cost, high-precision microfabrication.