Evaluation of a novel PECVD reactor for the intended continuous coating of flexible web material

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Philipp Alizadeh, Rainer Dahlmann
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引用次数: 0

Abstract

PET film samples were coated on a novel Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. The reactor represents a pioneering development as the first of its kind to be designed for the continuous coating of plastic film. The reactor is equipped with sequentially arranged airlocks, that facilitate a gradual reduction in pressure from ambient pressure to process pressure levels of a few pascals. The airlocks are equipped with slits that facilitate the uninterrupted introduction and extraction of the web material. In the experiments presented however, the film was positioned manually in the reactor to eliminate any potential influence from sliding contacts or similar mechanical stresses associated with film transport. The leakage flows associated with the airlocks were present in a manner consistent with subsequent automated operation. An investigation of the leakages was published earlier.
In the study presented here, the utilization of OTR measurements was instrumental in demonstrating the potential to align the coating process with the airlock system. Depending on the position inside the coating area, barrier against oxygen was improved by factors of up to 29. Furthermore, coating thickness measurements were utilized to show that the coating of the reactor walls was significantly reduced by using a process envelope.
一种新型PECVD反应器用于柔性卷材连续涂层的评价
在新型等离子体增强化学气相沉积(PECVD)反应器上涂覆PET薄膜样品。该反应器代表了一项开创性的发展,因为它是第一个为塑料薄膜的连续涂层而设计的。反应器配有顺序排列的气闸,便于压力从环境压力逐渐降低到几帕斯卡的过程压力水平。气闸配有狭缝,便于不间断地导入和提取网材。然而,在实验中,膜是手动放置在反应器中,以消除滑动接触或与膜传输相关的类似机械应力的任何潜在影响。与气闸相关的泄漏流以与后续自动化操作一致的方式存在。早些时候公布了对泄密事件的调查结果。在本文介绍的研究中,利用OTR测量有助于展示将涂层过程与气闸系统对齐的潜力。根据涂层内部位置的不同,抗氧屏障提高了29倍。此外,涂层厚度测量表明,反应器壁的涂层明显减少了使用过程包封。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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