{"title":"Evaluation of a novel PECVD reactor for the intended continuous coating of flexible web material","authors":"Philipp Alizadeh, Rainer Dahlmann","doi":"10.1016/j.vacuum.2025.114784","DOIUrl":null,"url":null,"abstract":"<div><div>PET film samples were coated on a novel Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. The reactor represents a pioneering development as the first of its kind to be designed for the continuous coating of plastic film. The reactor is equipped with sequentially arranged airlocks, that facilitate a gradual reduction in pressure from ambient pressure to process pressure levels of a few pascals. The airlocks are equipped with slits that facilitate the uninterrupted introduction and extraction of the web material. In the experiments presented however, the film was positioned manually in the reactor to eliminate any potential influence from sliding contacts or similar mechanical stresses associated with film transport. The leakage flows associated with the airlocks were present in a manner consistent with subsequent automated operation. An investigation of the leakages was published earlier.</div><div>In the study presented here, the utilization of OTR measurements was instrumental in demonstrating the potential to align the coating process with the airlock system. Depending on the position inside the coating area, barrier against oxygen was improved by factors of up to 29. Furthermore, coating thickness measurements were utilized to show that the coating of the reactor walls was significantly reduced by using a process envelope.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"243 ","pages":"Article 114784"},"PeriodicalIF":3.9000,"publicationDate":"2025-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25007742","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
PET film samples were coated on a novel Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. The reactor represents a pioneering development as the first of its kind to be designed for the continuous coating of plastic film. The reactor is equipped with sequentially arranged airlocks, that facilitate a gradual reduction in pressure from ambient pressure to process pressure levels of a few pascals. The airlocks are equipped with slits that facilitate the uninterrupted introduction and extraction of the web material. In the experiments presented however, the film was positioned manually in the reactor to eliminate any potential influence from sliding contacts or similar mechanical stresses associated with film transport. The leakage flows associated with the airlocks were present in a manner consistent with subsequent automated operation. An investigation of the leakages was published earlier.
In the study presented here, the utilization of OTR measurements was instrumental in demonstrating the potential to align the coating process with the airlock system. Depending on the position inside the coating area, barrier against oxygen was improved by factors of up to 29. Furthermore, coating thickness measurements were utilized to show that the coating of the reactor walls was significantly reduced by using a process envelope.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.