Modification of electrical characteristics of CVD- graphene by Joule heating

IF 3.9 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
M.G. Rybin , E.A. Guberna , V.A. Kamynin , Van Chuc Nguen , E.D. Obraztsova
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引用次数: 0

Abstract

This paper presents an approach for enhancing the electrical characteristics of graphene synthesized by chemical vapor deposition (CVD), through a direct resistive heating of the graphene channel by an electric current. This method efficiently purifies graphene of impurities and restores the material ideal structure through the desorption of adsorbed molecules. A graphene field-effect transistor was employed to characterize the graphene, specifically - to assess the mobility and concentration of charge carriers. The study investigates the impact of annealing temperature on both the concentration and type of charge carriers. It was found that CVD-synthesized graphene exhibits p-type conductivity, with the charge neutrality point (CNP) positioned above 80 Volts gate voltage at a 300 nm thickness of SiO2. Annealing at 200 °C shifted this neutrality point to 0 Volts, switching the graphene to electrical neutrality. At higher annealing temperatures, n-type conductivity was achieved. Additionally, during the annealing process with current flow, there was a significant enhancement of the charge carriers mobility in graphene: for holes, mobility increased from 1000 cm²/(V·s) to 1800 cm²/(V·s), and for electrons - from 600 cm²/(V·s) to 1200 cm²/(V·s). Thus, the study reveals the effective method for removing impurities appeared after transfer of CVD graphene from copper foil to a dielectric substrate. This approach may be utilized in preparing samples for applications in microelectronics, optoelectronics, and related fields.
焦耳加热法修饰CVD-石墨烯的电特性
本文提出了一种通过电流对石墨烯通道进行直接电阻加热来提高化学气相沉积(CVD)合成的石墨烯电学特性的方法。该方法通过吸附分子的解吸,有效地净化石墨烯中的杂质,恢复材料的理想结构。石墨烯场效应晶体管被用来表征石墨烯,特别是评估电荷载流子的迁移率和浓度。研究了退火温度对载流子浓度和载流子类型的影响。发现cvd合成的石墨烯具有p型电导率,在厚度为300 nm的SiO2上,电荷中性点(CNP)位于80伏栅极电压以上。在200°C下退火将这个中性点转移到0伏,将石墨烯转换为电中性。在较高的退火温度下,实现了n型电导率。此外,在电流退火过程中,石墨烯中载流子的迁移率显著增强:对于空穴,迁移率从1000 cm²/(V·s)增加到1800 cm²/(V·s),对于电子-从600 cm²/(V·s)增加到1200 cm²/(V·s)。因此,该研究揭示了去除CVD石墨烯从铜箔转移到介电基板后出现的杂质的有效方法。该方法可用于制备微电子学、光电子学及相关领域的样品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Carbon Trends
Carbon Trends Materials Science-Materials Science (miscellaneous)
CiteScore
4.60
自引率
0.00%
发文量
88
审稿时长
77 days
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