Highly Sensitive Ultraviolet Power Meter based on Two-Dimensional van der Waals Heterostructure.

IF 2.8 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Nanotechnology Pub Date : 2025-10-09 DOI:10.1088/1361-6528/ae1141

Bangchi Huang, Xiang Li, Jianlin Shi, Zhipeng Zhong, Yezhao Zhuang, Yizihan Zhang, Tie Lin, Xiangjian Meng, Hai Huang, Junhao Chu, Jiao Peng

{"title":"Highly Sensitive Ultraviolet Power Meter based on Two-Dimensional van der Waals Heterostructure.","authors":"Bangchi Huang, Xiang Li, Jianlin Shi, Zhipeng Zhong, Yezhao Zhuang, Yizihan Zhang, Tie Lin, Xiangjian Meng, Hai Huang, Junhao Chu, Jiao Peng","doi":"10.1088/1361-6528/ae1141","DOIUrl":null,"url":null,"abstract":"<p><p>The increasing demand for high-precision ultraviolet (UV) detection in applications such as environmental monitoring, industrial inspection, and public safety necessitates the development of advanced UV power meters with high sensitivity, and low detection limits. In this work, we demonstrate a high-performance UV photodetector based on the interface barrier controlled two-dimensional heterostructure of Au/hBN/MoS 2 on Si/SiO 2 substrate, which can function as a precise UV power meter with high precision. The device exhibits an ultrahigh photoresponsivity up to 1.03×10 5 A/W to 254 nm UVC light with an excellent spectral selectivity. In particular, the distinctive inverse relationship between the response time and incident light intensity enables accurate power calibration for incident UV irradiation. The device, demonstrated in a TO-46 packaged configuration, is capable of detecting UV light with intensities as low as 0.7 μW/cm 2 . Its measurement accuracy is verified through the power radiation law, and the detection limit surpasses that of commercial UV power meters. These results highlight a promising strategy for developing next-generation UV photodetectors based on two-dimensional heterostructures.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanotechnology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1088/1361-6528/ae1141","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

Abstract

The increasing demand for high-precision ultraviolet (UV) detection in applications such as environmental monitoring, industrial inspection, and public safety necessitates the development of advanced UV power meters with high sensitivity, and low detection limits. In this work, we demonstrate a high-performance UV photodetector based on the interface barrier controlled two-dimensional heterostructure of Au/hBN/MoS 2 on Si/SiO 2 substrate, which can function as a precise UV power meter with high precision. The device exhibits an ultrahigh photoresponsivity up to 1.03×10 5 A/W to 254 nm UVC light with an excellent spectral selectivity. In particular, the distinctive inverse relationship between the response time and incident light intensity enables accurate power calibration for incident UV irradiation. The device, demonstrated in a TO-46 packaged configuration, is capable of detecting UV light with intensities as low as 0.7 μW/cm 2 . Its measurement accuracy is verified through the power radiation law, and the detection limit surpasses that of commercial UV power meters. These results highlight a promising strategy for developing next-generation UV photodetectors based on two-dimensional heterostructures.

查看原文本刊更多论文

基于二维范德华异质结构的高灵敏度紫外功率计。

在环境监测、工业检查和公共安全等应用中对高精度紫外（UV）检测的需求日益增长，需要开发具有高灵敏度和低检测限的先进紫外功率计。在这项工作中，我们展示了一种基于界面势垒控制的Au/hBN/MoS 2在Si/ sio2衬底上的二维异质结构的高性能紫外光电探测器，它可以作为高精度的紫外功率计。该器件对254 nm紫外光的光响应率高达1.03×10 5 A/W，具有优异的光谱选择性。特别是，响应时间和入射光强度之间独特的反比关系使入射紫外线照射的精确功率校准成为可能。该器件采用TO-46封装结构，能够检测强度低至0.7 μW/ cm2的紫外光。通过功率辐射定律验证其测量精度，检测限超过商用紫外功率计。这些结果强调了基于二维异质结构开发下一代紫外光电探测器的有希望的策略。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Nanotechnology 工程技术-材料科学：综合

CiteScore

7.10

自引率

5.70%

发文量

820

审稿时长

2.5 months

期刊介绍： The journal aims to publish papers at the forefront of nanoscale science and technology and especially those of an interdisciplinary nature. Here, nanotechnology is taken to include the ability to individually address, control, and modify structures, materials and devices with nanometre precision, and the synthesis of such structures into systems of micro- and macroscopic dimensions such as MEMS based devices. It encompasses the understanding of the fundamental physics, chemistry, biology and technology of nanometre-scale objects and how such objects can be used in the areas of computation, sensors, nanostructured materials and nano-biotechnology.