Effect of cadmium doping on gas sensitivity for CdxNi1−xFe2O4 thin films prepared via pulsed laser deposition on silicon substrate

IF 4 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Farah T. M. Noori, Mohammed W. Muayad, Uday M. Nayef, Kareem H. Jawad, Muayed Y. Kdhair, A. Kadhim, Ayat A. Salman, Abbas M. Ali, Abrar Z. AbdulKadhim
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Abstract

In this study, nanostructured CdxNi1−xFe2O4(0 ≤ x ≤ 0.9) thin films were deposited on silicon substrates using pulsed laser deposition (PLD), and their structural, optical, and gas-sensing properties were thoroughly examined. X-ray diffraction analysis indicated that the samples possess a single-phase inverse spinel structure, with the average crystallite size decreasing from 13 nm (x = 0) to 8 nm (x = 0.9). The average grain size of Cd increased from 62.95 to 98.74 nm, as shown by atomic force microscopy, and the maximum surface roughness was 6.1 nm at x = 0.7. Optical measurements, which are associated with enhanced electronic polarizability, demonstrated improved UV photon absorption. Gas-sensing tests for 70 ppm NO2 revealed a substantial increase in sensitivity, reaching a maximum of 145% at an optimal operating temperature of 200 °C, with the fastest response time of 4.7 s at x = 0.9 and a recovery time of approximately 21 s. These findings unequivocally demonstrate that well-controlled Cd doping significantly enhances the surface reactivity and electronic transport of Cdxni1-xfe2o4 thin films, making PLD-grown compositions highly competitive and effectively adjustable candidates for NO2 detection.

Abstract Image

镉掺杂对脉冲激光沉积CdxNi1−xFe2O4薄膜气敏性的影响
在本研究中,利用脉冲激光沉积技术(PLD)在硅衬底上沉积了纳米结构的CdxNi1−xFe2O4(0≤x≤0.9)薄膜,并对其结构、光学和气敏性能进行了全面的测试。x射线衍射分析表明,样品具有单相反尖晶石结构,平均晶粒尺寸从13 nm (x = 0)减小到8 nm (x = 0.9)。原子力显微镜显示Cd的平均晶粒尺寸从62.95 nm增加到98.74 nm,在x = 0.7时表面粗糙度最大为6.1 nm。与增强的电子极化率相关的光学测量表明,紫外光子吸收得到了改善。在70 ppm NO2条件下的气敏测试结果显示,灵敏度大幅提高,在200°C的最佳工作温度下,灵敏度最高可达145%,在x = 0.9时的最快响应时间为4.7 s,恢复时间约为21 s。这些发现明确地表明,控制良好的Cd掺杂显著提高了Cdxni1-xfe2o4薄膜的表面反应性和电子输运,使pld生长的组合物具有很强的竞争力和有效的NO2检测候选物。
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来源期刊
Optical and Quantum Electronics
Optical and Quantum Electronics 工程技术-工程:电子与电气
CiteScore
4.60
自引率
20.00%
发文量
810
审稿时长
3.8 months
期刊介绍: Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest. Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.
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