Iva Šarić Janković, Robert Peter, Ivna Kavre Piltaver, Harun Hano, Karlo Veličan, Antonio Borzatti, Mato Knez, Mladen Petravić
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引用次数: 0
Abstract
In this study, we investigate the reduction mechanism and modifications of the electronic structure of anatase TiO2 thin films induced by low-energy H2+ ion bombardment at room temperature, focusing on hydrogen-induced changes in the oxidation states of Ti atoms, local chemical bonding of oxygen and the formation of defect states within the band gap. During the initial stages of bombardment, the energetic hydrogen reacts with lattice oxygen to form hydroxyl groups, followed by the reduction of Ti4+ to Ti3+. For the higher doses, the formation of H − O − H bridge bonds causes splitting of O − Ti bonds and formation of H2O gas molecules, accompanied by a reduction of Ti3+ and Ti4+ states to Ti2+. At the same time, the reduction of Ti4+ to lower oxidation states introduces some defect states within the band gap of TiO2, associated with Ti3+ defects or the formation of double-oxygen-vacancy clusters at Ti2+ sites.
期刊介绍:
Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.