Facile construction of HOF@ZnO/TiO2 ternary composite for efficient photocatalytic degradation of dyes

IF 6.9 2区 材料科学 Q2 CHEMISTRY, PHYSICAL
Xuan Zheng, Jingyi Sun, Mei Yang, Zhongyue Li
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Abstract

In this study, a ternary composite photocatalyst, HOF@ZnO/TiO2, was constructed by physically integrating a hydrogen-bonded organic framework (HOF-TCPB) with ZnO/TiO2. The aim was to combine the excellent adsorption capacity of HOFs with the charge separation capabilities of the semiconductor composite to enhance photocatalytic efficiency. Comprehensive characterization revealed that the composite exhibited improved light absorption, enhanced charge carrier separation, and a broad operational pH window. The optimized HOF@ZnO/TiO2 achieved a high methylene blue (MB) removal efficiency of 93%, with at least 65% of the overall removal resulting from photo-induced degradation, while adsorption also plays a significant role. Mechanistic studies, including radical scavenging and EPR analysis, confirmed the participation of reactive oxygen species (·O2 and ·OH) in the degradation process, facilitated by the synergistic interactions among the three components and dye sensitization effects. This work provides a promising strategy for designing multifunctional photocatalysts by combining porous organic frameworks with semiconductor materials for practical environmental remediation applications.

Abstract Image

Abstract Image

高效光催化降解染料的HOF@ZnO/TiO2三元复合材料的简单构建
本研究通过物理整合氢键有机骨架(HOF-TCPB)与ZnO/TiO2,构建了三元复合光催化剂HOF@ZnO/TiO2。目的是将HOFs优异的吸附能力与半导体复合材料的电荷分离能力相结合,以提高光催化效率。综合表征表明,该复合材料具有更好的光吸收,增强的电荷载流子分离和宽的操作pH窗口。优化后的HOF@ZnO/TiO2对亚甲基蓝(MB)的去除率高达93%,其中至少65%的亚甲基蓝去除率来自光诱导降解,同时吸附也起着重要作用。机理研究,包括自由基清除和EPR分析,证实了活性氧(·O2−和·OH)在三种成分之间的协同作用和染料敏化作用的促进下参与降解过程。这项工作为设计多功能光催化剂提供了一种有前途的策略,将多孔有机框架与半导体材料结合起来,用于实际的环境修复应用。
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来源期刊
Applied Surface Science
Applied Surface Science 工程技术-材料科学:膜
CiteScore
12.50
自引率
7.50%
发文量
3393
审稿时长
67 days
期刊介绍: Applied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.
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