Functionalized Indazaboles: A New Class of Low-k Interfacial Layer for Multi-Polar Charge Transport in Organic Field Effect Transistors

IF 12.1 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Small Pub Date : 2025-10-07 DOI:10.1002/smll.202507561
Anna Chandrasekar Murali, Mrinali Mohanty, Riya Singh, Indrajit Mondal, Subrat Rout, Avani A, Biplab K. Patra, Satyaprasad P. Senanayak, Krishnan Venkatasubbaiah
{"title":"Functionalized Indazaboles: A New Class of Low-k Interfacial Layer for Multi-Polar Charge Transport in Organic Field Effect Transistors","authors":"Anna Chandrasekar Murali, Mrinali Mohanty, Riya Singh, Indrajit Mondal, Subrat Rout, Avani A, Biplab K. Patra, Satyaprasad P. Senanayak, Krishnan Venkatasubbaiah","doi":"10.1002/smll.202507561","DOIUrl":null,"url":null,"abstract":"Demonstration of high-performance field effect transistors (FETs) necessitates designing of ordered semiconductors as well as dielectric materials with a low degree of dipolar disorder. Majority of efforts for improving the performance of FETs has been directed toward modifying the semiconducting layer. Here, indazaboles, which are a class of relatively unexplored tetra-coordinated organoboranes, are utilized as an active interfacial layer in a field effect transistor structure. It is shown that with suitable functionalization of the indazabole core, it is possible to tune the dielectric constant ranging from 2.2 to 5.1. Such wide tunability of the dielectric constant makes these materials fundamentally interesting as a platform to controllably probe the effect of interfacial dipolar disorder on the field effect charge transport. These indazaboles, when introduced as a low k-modifying layer at the transport interface on conventional oxide dielectric result in significant enhancement of both electron and hole field effect mobility by up to six times. The results bring out the applicability of this new class of indazabole materials as dielectric material supporting multi-polar transport and provide insight for developing high performance field effect transistor through suitable interfacial chemical design.","PeriodicalId":228,"journal":{"name":"Small","volume":"348 1","pages":""},"PeriodicalIF":12.1000,"publicationDate":"2025-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/smll.202507561","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Demonstration of high-performance field effect transistors (FETs) necessitates designing of ordered semiconductors as well as dielectric materials with a low degree of dipolar disorder. Majority of efforts for improving the performance of FETs has been directed toward modifying the semiconducting layer. Here, indazaboles, which are a class of relatively unexplored tetra-coordinated organoboranes, are utilized as an active interfacial layer in a field effect transistor structure. It is shown that with suitable functionalization of the indazabole core, it is possible to tune the dielectric constant ranging from 2.2 to 5.1. Such wide tunability of the dielectric constant makes these materials fundamentally interesting as a platform to controllably probe the effect of interfacial dipolar disorder on the field effect charge transport. These indazaboles, when introduced as a low k-modifying layer at the transport interface on conventional oxide dielectric result in significant enhancement of both electron and hole field effect mobility by up to six times. The results bring out the applicability of this new class of indazabole materials as dielectric material supporting multi-polar transport and provide insight for developing high performance field effect transistor through suitable interfacial chemical design.

Abstract Image

功能化吲哚代谢:一类用于有机场效应晶体管中多极电荷输运的新型低k界面层
高性能场效应晶体管(fet)的演示需要设计有序的半导体以及具有低程度偶极无序的介电材料。改善场效应管性能的大部分努力都是针对半导体层的修改。在这里,indazaboles是一类相对未开发的四配位有机硼烷,被用作场效应晶体管结构中的有源界面层。结果表明,通过对可达电芯进行适当的功能化,可以将介电常数调节在2.2 ~ 5.1之间。这种介电常数的广泛可调性使这些材料从根本上成为一个有趣的平台,可以控制地探测界面偶极无序对场效应电荷输运的影响。当这些吲哚作为低k修饰层引入传统氧化物介电介质的输运界面时,电子和空穴场效应迁移率都显著提高了6倍。结果揭示了这类新型可达材料作为支持多极输运的介电材料的适用性,并为通过适当的界面化学设计开发高性能场效应晶体管提供了思路。
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来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
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