Patch Clamp for MoS2 Layer-Dependent Hydrogen Evolution Reaction

IF 3.5 4区 化学 Q2 ELECTROCHEMISTRY
Zhipeng Zhang, Kuan Zhai, Junhong Chen, Chunhua Han, Yuehua Wen, Yuhang Chen, Yadi Zhou, Jiayi Chen, Xiaobin Liao, Shumin Chen, Mengyu Yan
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Abstract

Conventional electrochemical experiments can only obtain the average contribution of all active sites in the catalyst. Hence, it is meaningful to distinguish the electrochemical contribution of the local active sites in single-crystal catalysts. Here, a double-hole patch clamp is designed to achieve a localized electrochemical measurement in a model catalyst, MoS2. The double-hole patch clamp is further applied to measure the hydrogen evolution reaction of MoS2. By increasing the MoS2 thickness from monolayer to bilayer, the onset potential increases from 156 to 238 mV. There is no obvious electrocatalytic reaction by further increasing the MoS2 thickness to the trilayer. This could contribute to the ≈2.1 eV out-of-plane bandgap and corresponding high vertical resistance of MoS2. This double-hole patch clamp provides a new tool to understand the electrocatalysis activities of the local active sites.

Abstract Image

基于MoS2层析氢反应的膜片钳
传统的电化学实验只能得到催化剂中所有活性位点的平均贡献。因此,区分单晶催化剂中局部活性位点的电化学贡献是有意义的。在这里,设计了一个双孔膜片钳来实现模型催化剂MoS2的局部电化学测量。进一步应用双孔膜片钳测量二硫化钼的析氢反应。当MoS2厚度由单层增加到双层时,起始电位由156 mV增加到238 mV。进一步增加三层MoS2的厚度,电催化反应不明显。这使得MoS2具有≈2.1 eV的面外带隙和相应的高垂直电阻。这种双孔膜片钳为了解局部活性位点的电催化活性提供了一种新的工具。
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来源期刊
ChemElectroChem
ChemElectroChem ELECTROCHEMISTRY-
CiteScore
7.90
自引率
2.50%
发文量
515
审稿时长
1.2 months
期刊介绍: ChemElectroChem is aimed to become a top-ranking electrochemistry journal for primary research papers and critical secondary information from authors across the world. The journal covers the entire scope of pure and applied electrochemistry, the latter encompassing (among others) energy applications, electrochemistry at interfaces (including surfaces), photoelectrochemistry and bioelectrochemistry.
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