Nikita Pavlushin, Jie Wang, Fangyu Liu, Muchen Zhou
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引用次数: 0
Abstract
Particle accelerators are complex and large facilities requiring appropriate maintenance and operation condition control. Despite accelerator facility staff following all necessary operation regulations and the high-quality equipment usage, it is impossible to avoid some minor faults causing the pressure to arise inside the facility vacuum vessel. However, it is possible that during particle accelerator operation there is a gauge fault but vacuum pipeline pressure does not exceed the estimated critical value. In this case, operation should not be stopped, and the gauge can be easily replaced at the next planned maintenance session. In this article, the combination of Monte Carlo pressure simulation and a linear regression model to predict the pressure profile along the pipeline axis is shown. As a result, a trained AI-model based on a linear regression algorithm is able to predict the maximal pressure in the vacuum pipeline and define the pressure on a broken gauge according to other gauges’ measurements.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.