Ibrahim Yaacoub Bouderbala, Amir Guessoum, Selma Rabhi, Abdelmadjid Herbadji, Imed-Eddine Bouras
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引用次数: 0
Abstract
This article has been allocated to studying microstructural features and optical properties of the polycrystalline thin ZnO films. ZnO thin films were deposited on glass substrates using a sol–gel dip-coating process with varied layer numbers (8, 10, and 12). Structural characterization via XRD confirmed a polycrystalline wurtzite structure with enhanced crystallinity as the number of layers increased and increasing the crystallite size from 34.8 ± 0.6 to 40.9 ± 0.7 nm. FE-SEM analysis revealed increased surface wrinkle size and reduced grain boundaries with thickness. Optical measurements showed high transmittance (> 80%) in the visible region and a slight reduction in bandgap energy from 3.17 ± 0.07 to 3.11 ± 0.03 eV with an increase in Urbach energy from 763.9 ± 5.3 to 847.3 ± 6.1meV. Photocatalytic performance was evaluated by degrading Rhodamine B under UV light, showing a significant enhancement in degradation rate from 0.034 ± 0.007 to 0.072 ± 0.008 min−1 with increased film thickness. These findings highlight the potential of thickness-optimized ZnO films for environmental photocatalytic applications.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.