Dual Chemical Bath and Drop-Casting Strategy for CoV2O6/BiVO4 Heterostructure Fabrication to Improve Charge Separation and Boost Photoelectrochemical Water Splitting

IF 6 3区 工程技术 Q2 ENERGY & FUELS
Solar RRL Pub Date : 2025-09-09 DOI:10.1002/solr.202500470
Tahir Naveed Jahangir, Alanud S. F Almelehi, Muhammad Younas, Tarek A. Kandiel
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Abstract

Developing a facile approach for the fabrication of high-quality BiVO4 films is essential to enhance the photoelectrochemical performance of BiVO4 photoanodes. Herein, we report a novel dual chemical bath deposition and drop-casting strategy for fabricating pinhole-free CoV2O6/BiVO4 heterostructure. First, a Co(OH)2 layer was grown on an FTO substrate via chemical bath deposition. Then, a Bi/V precursor mixture was drop-cast and annealed to obtain high-quality CoV2O6/BiVO4 photoanodes. This dual-deposition approach was crucial for preventing pinhole formation and thereby minimizing the solution-mediated back-reduction reaction at the FTO back contact. Photoelectrochemical measurements revealed that the CoV2O6/BiVO4 photoanodes exhibited a fivefold increase in photocurrent compared to pristine BiVO4 photoanodes. After modification with water oxidation cocatalysts, the photoanodes delivered a stable photocurrent density of 4.55 mA cm−2 at 1.23 VRHE. They demonstrated a Faradaic efficiency of 95% and achieved an applied bias photon-to-current efficiency of 1.45%, representing a sevenfold improvement over pristine BiVO4. The enhanced photoelectrocatalytic performance is primarily attributed to the formation of the pinhole-free CoV2O6/BiVO4 heterostructure, which suppresses surface recombination and extends the lifetime of photogenerated holes, as confirmed by transient photocurrent and intensity-modulated photocurrent spectroscopy measurements. The developed dual-deposition strategy is facile and can be applied to other metal oxide-based photoanodes.

Abstract Image

CoV2O6/BiVO4异质结构制备的双化学浴和滴铸策略改善电荷分离和促进光电化学水分解
开发一种制备高质量BiVO4薄膜的简便方法对于提高BiVO4光阳极的光电电化学性能至关重要。在此,我们报告了一种新的双化学浴沉积和滴铸策略,用于制造无针孔的CoV2O6/BiVO4异质结构。首先,通过化学浴沉积在FTO衬底上生长Co(OH)2层。然后,将Bi/V前驱体混合物滴铸退火,得到高质量的CoV2O6/BiVO4光阳极。这种双沉积方法对于防止针孔形成至关重要,从而最大限度地减少FTO反接触处溶液介导的反还原反应。光电化学测量表明,与原始的BiVO4光阳极相比,CoV2O6/BiVO4光阳极的光电流增加了5倍。经水氧化共催化剂修饰后,光阳极在1.23 VRHE下的稳定光电流密度为4.55 mA cm−2。他们证明了95%的法拉第效率,并实现了1.45%的应用偏压光子电流效率,比原始的BiVO4提高了7倍。瞬态光电流和强度调制光电流光谱测量证实,增强的光电催化性能主要归因于无针孔CoV2O6/BiVO4异质结构的形成,该异质结构抑制了表面复合并延长了光生孔的寿命。所开发的双沉积策略简便,可应用于其他金属氧化物基光阳极。
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来源期刊
Solar RRL
Solar RRL Physics and Astronomy-Atomic and Molecular Physics, and Optics
CiteScore
12.10
自引率
6.30%
发文量
460
期刊介绍: Solar RRL, formerly known as Rapid Research Letters, has evolved to embrace a broader and more encompassing format. We publish Research Articles and Reviews covering all facets of solar energy conversion. This includes, but is not limited to, photovoltaics and solar cells (both established and emerging systems), as well as the development, characterization, and optimization of materials and devices. Additionally, we cover topics such as photovoltaic modules and systems, their installation and deployment, photocatalysis, solar fuels, photothermal and photoelectrochemical solar energy conversion, energy distribution, grid issues, and other relevant aspects. Join us in exploring the latest advancements in solar energy conversion research.
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