Sebastian Anand,Dineshkumar Mani,Md Akhtarul Islam,Won-Kook Choi,Pyeong Jun Park,Hanchul Kim,Sung-Ryong Kim
{"title":"Self-Alignment of MXene Films Induced by Electrostatic Repulsion from TaS2 Nanosheets for Multifunctional Applications.","authors":"Sebastian Anand,Dineshkumar Mani,Md Akhtarul Islam,Won-Kook Choi,Pyeong Jun Park,Hanchul Kim,Sung-Ryong Kim","doi":"10.1021/acsami.5c12084","DOIUrl":null,"url":null,"abstract":"Fabricating freestanding films with pristine MXene aims at meeting all-around high standards of modern electronics through boosting high electrical conductivity, thermal conductivity, and robust mechanical strength. However, voids and defects arising during fabrication often limit the performance and versatility. An effective electrostatic repulsion-induced alignment strategy is suggested here to overcome the major obstacles in the industrial application of MXene films. This approach combines polydopamine (PDA)-modified MXene with two-dimensional (2D) tantalum disulfide (TaS2) nanosheets to enhance the alignment and compactness of MXene layers. Incorporating a small amount of TaS2 nanosheets, which carry negative charges, facilitates the alignment of PDA-modified MXene sheets during film assembly via electrostatic repulsion. This results in the fabrication of strong and well-ordered composite films with a synergistic effect between MXene and TaS2. The resultant MXene/TaS2 (MXT) films exhibit high mechanical strength (92 MPa), toughness (2.49 MJ·m-3), excellent electrical conductivity (7932 S cm-1), electromagnetic interference (EMI), shielding effectiveness (SE) (62 dB), and superior in-plane thermal conductivity (53.19 W·m-1·K-1). In addition, MXT films demonstrate remarkable Joule heating performance and environmental stability.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"24 1","pages":""},"PeriodicalIF":8.2000,"publicationDate":"2025-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.5c12084","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Fabricating freestanding films with pristine MXene aims at meeting all-around high standards of modern electronics through boosting high electrical conductivity, thermal conductivity, and robust mechanical strength. However, voids and defects arising during fabrication often limit the performance and versatility. An effective electrostatic repulsion-induced alignment strategy is suggested here to overcome the major obstacles in the industrial application of MXene films. This approach combines polydopamine (PDA)-modified MXene with two-dimensional (2D) tantalum disulfide (TaS2) nanosheets to enhance the alignment and compactness of MXene layers. Incorporating a small amount of TaS2 nanosheets, which carry negative charges, facilitates the alignment of PDA-modified MXene sheets during film assembly via electrostatic repulsion. This results in the fabrication of strong and well-ordered composite films with a synergistic effect between MXene and TaS2. The resultant MXene/TaS2 (MXT) films exhibit high mechanical strength (92 MPa), toughness (2.49 MJ·m-3), excellent electrical conductivity (7932 S cm-1), electromagnetic interference (EMI), shielding effectiveness (SE) (62 dB), and superior in-plane thermal conductivity (53.19 W·m-1·K-1). In addition, MXT films demonstrate remarkable Joule heating performance and environmental stability.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.