Type-I Band Engineering of van der Waals InSe/TiS3 Heterostructures for Broadband and Polarization-Sensitive Photodetection with a Large Dichroic Ratio
IF 8.2 2区 材料科学Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0
Abstract
van der Waals (vdW) heterostructures formed from two-dimensional (2D) layered materials have opened promising avenues in broadband photodetection, particularly in polarization-sensitive applications. Previous research indicates that type-I heterostructures hold considerable potential for broadband polarization photodetector development; however, achieving high polarization sensitivity in these vdW heterostructures has remained insufficiently explored. In this work, we systematically present combined theoretical and experimental studies on designing and fabricating a high-performance photodetector based on the InSe/TiS3 vdW heterostructure exhibiting type-I band alignment. Theoretical studies supported by experimental verification confirmed the presence of a type-I band alignment between InSe and TiS3. Leveraging this favorable band alignment, the fabricated device demonstrated broadband photodetection spanning the deep ultraviolet to near-infrared spectral range along with pronounced polarization sensitivity. The photodetector exhibited superior performance metrics, including a high responsivity of 55 A/W–1, detectivity of 1.80 × 1013 Jones, an external quantum efficiency reaching 15,633%, and a rapid response time of approximately 23.6 μs. Additionally, significant polarization sensitivity was observed, characterized by a notable dichroic ratio of approximately 5, emphasizing the device’s potential for advanced optoelectronic applications. This study provides valuable insights and a practical reference for the development of high-performance polarized photodetectors across a broad spectral range.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.