First-principles investigation of the electronic, piezoelectric and transport properties of InSeX (X = Cl, Br, I) monolayers.

IF 4.6 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
D Vo Dat, Tuan V Vu, A I Kartamyshev, Thi H Ho, Hoang-Thinh Do, Vu Khac Hoang Bui, Phan T H Linh, Nguyen D Hien
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引用次数: 0

Abstract

First-principles calculation was performed to study InSeX (X = Cl, Br, and I) monolayers, which are formed by the breaking of In-In bonds in InSe monolayers through full halogenation. The isolated InSeX monolayers have Se-In-X stacking configuration with a buckled honeycomb structure maintained by newly formed Se-sp3 hybrid orbitals. InSeX (X = Cl, Br, and I) monolayers have good mechanical properties with Young's modulus in the range of 28.69-33.44 N m-1 and a Poisson's ratio of nearly 0.30. Their in-plane structures are expected to be highly isotropic due to the independence of elastic parameters on the angle of applied strains. A high carrier concentration (1020 cm-3) and scattering mechanisms greatly reduce the mobility of these monolayers, especially at high temperature. However, the InSeI monolayer appears to be a promising material because its electron mobility is rather high, 10.82-217.33 cm2 V-1 s-1, at a temperature of 50-400 K. InSeX (X = Cl, Br, and I) monolayers are also promising piezoelectric materials with high in-plane piezoelectric coefficients e 11 in the range of 3.34-5.60 × 10-10 C m-1 and d 11 of 14.90-33.50 pm V-1. The current study provides the mechanism of how isolated InSeX (X = Cl, Br, and I) monolayers are formed and stabilized, which is useful to expand the new subclass of 2D materials by applying the same procedure for group XIII monochalcogenides (MX, where M = B, Al, Ga, In, Tl and X = S, Se, Te). InSeX (X = Cl, Br, and I) monolayers are also promising for a wide range of applications because of the broad tunability of the bandgap (1.36-2.94 eV), band edge positions, and work function (4.80-7.80 eV).

InSeX (X = Cl, Br, I)单层材料电子、压电和输运性质的第一性原理研究。
采用第一性原理计算研究了InSeX (X = Cl, Br, and I)单分子膜,它是由InSe单分子膜中的in - in键在全卤化过程中断裂而形成的。孤立的InSeX单层具有Se-In-X叠加构型,由新形成的Se-sp3杂化轨道维持屈曲蜂窝结构。InSeX (X = Cl, Br, and I)单层膜具有良好的力学性能,杨氏模量在28.69 ~ 33.44 N m-1之间,泊松比接近0.30。由于弹性参数与外加应变角无关,它们的面内结构有望具有高度各向同性。高载流子浓度(1020 cm-3)和散射机制大大降低了这些单层的迁移率,特别是在高温下。然而,InSeI单层材料似乎是一种很有前途的材料,因为它在50-400 K温度下的电子迁移率相当高,为10.82-217.33 cm2 V-1 s-1。InSeX (X = Cl, Br, and I)单分子层也是很有前途的压电材料,其面内压电系数e11在3.34-5.60 × 10-10 C m-1范围内,d11在14.90-33.50 pm V-1范围内。目前的研究提供了分离InSeX (X = Cl, Br和I)单层如何形成和稳定的机制,这有助于通过对13族单硫属化合物(MX,其中M = B, Al, Ga, In, Tl和X = S, Se, Te)应用相同的程序扩展新的2D材料亚类。由于带隙(1.36-2.94 eV)、带边位置和工作函数(4.80-7.80 eV)的广泛可调性,InSeX (X = Cl, Br和I)单层也有广泛的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nanoscale Advances
Nanoscale Advances Multiple-
CiteScore
8.00
自引率
2.10%
发文量
461
审稿时长
9 weeks
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