Jiaqi Zhang, Xiao Cao, Li Peng, Gang Sun, Xianbo Huang, Quan Chen
{"title":"Influence of Sodium Ion Content on the Structure and Mechanical Properties of Polyethylene Methacrylic Acid Ionomers","authors":"Jiaqi Zhang, Xiao Cao, Li Peng, Gang Sun, Xianbo Huang, Quan Chen","doi":"10.1016/j.polymer.2025.129152","DOIUrl":null,"url":null,"abstract":"Ionomers, such as neutralized ethylene-methacrylic acid (EMAA) copolymers, are widely used materials whose mechanical properties are governed by the interplay between crystalline domains and ionic aggregates. In this study, we systematically investigate how varying the degree of neutralization affects the crystallization kinetics and mechanical performance of EMAA ionomers. Our results show that increasing neutralization reduces the mobility of ionic associations, leading to suppressed crystallization. Notably, the tradeoff between physical crosslinking and crystallization determines the material’s creep and tensile resistances, and an optimal degree of neutralization has been identified where the highest creep resistance, yield resistance, and toughness have been achieved. In particular, the flow-induced breakup of ionic associations appears to be responsible for the sample toughening before the slip of the crystalline lamellae. These findings provide insights into the design of ionomer materials with tailored mechanical performance.","PeriodicalId":405,"journal":{"name":"Polymer","volume":"21 1","pages":""},"PeriodicalIF":4.5000,"publicationDate":"2025-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Polymer","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1016/j.polymer.2025.129152","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
引用次数: 0
Abstract
Ionomers, such as neutralized ethylene-methacrylic acid (EMAA) copolymers, are widely used materials whose mechanical properties are governed by the interplay between crystalline domains and ionic aggregates. In this study, we systematically investigate how varying the degree of neutralization affects the crystallization kinetics and mechanical performance of EMAA ionomers. Our results show that increasing neutralization reduces the mobility of ionic associations, leading to suppressed crystallization. Notably, the tradeoff between physical crosslinking and crystallization determines the material’s creep and tensile resistances, and an optimal degree of neutralization has been identified where the highest creep resistance, yield resistance, and toughness have been achieved. In particular, the flow-induced breakup of ionic associations appears to be responsible for the sample toughening before the slip of the crystalline lamellae. These findings provide insights into the design of ionomer materials with tailored mechanical performance.
期刊介绍:
Polymer is an interdisciplinary journal dedicated to publishing innovative and significant advances in Polymer Physics, Chemistry and Technology. We welcome submissions on polymer hybrids, nanocomposites, characterisation and self-assembly. Polymer also publishes work on the technological application of polymers in energy and optoelectronics.
The main scope is covered but not limited to the following core areas:
Polymer Materials
Nanocomposites and hybrid nanomaterials
Polymer blends, films, fibres, networks and porous materials
Physical Characterization
Characterisation, modelling and simulation* of molecular and materials properties in bulk, solution, and thin films
Polymer Engineering
Advanced multiscale processing methods
Polymer Synthesis, Modification and Self-assembly
Including designer polymer architectures, mechanisms and kinetics, and supramolecular polymerization
Technological Applications
Polymers for energy generation and storage
Polymer membranes for separation technology
Polymers for opto- and microelectronics.