Fabrication and structural analysis of amorphous GeTe4, Sb2Te3 and Ge20SbxTe80-x thin films prepared by thermal evaporation

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
S. N. Garibova, A. I. Isayev, I. A. Mamedova, M. E. Aliyev, F. Sarcan
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Abstract

Amorphous Ge20Te80, Sb40Te60, and Ge20SbxTe80-x (x = 1, 2, 5, 10) compounds were synthesized and deposited as thin films (40–80 nm) on glass substrates via thermal evaporation under high vacuum (10–5 Torr). Their structural characteristics were examined using X-ray diffraction, scanning electron microscopy, and atomic-force microscopy. Applying the void–cluster model, the quasi-period of density fluctuations (r), correlation length (L), and packing fraction (L/r) were estimated from the first sharp diffraction peak in the XRD patterns. Partial substitution of Te by Sb in Ge20Te80 led to a reduction in L and L/r, indicating increase in structural disorder. Raman spectroscopy revealed vibrational modes associated with short-range ordering in Ge20Te80 and Sb40Te60, aiding interpretation of Ge20SbₓTe80₋ₓ films. In Ge20Te80, dominant Raman peaks at 121.5 and 139 cm−1 were assigned to GeTe₄₋nGen (n = 0, 1) tetrahedra, while bands at 154–159 cm−1 and 174–177 cm−1 corresponded to Te chains and defective octahedral units. For Sb40Te60 films, peaks at 124.5 and 142 cm−1 were attributed to Sb–Te vibrations in pyramidal SbTe₃ units and distorted octahedral Sb coordination. Additional peaks at 97 and 152 cm−1 were associated with Te–Te bonds, while the band at 113.5 cm−1 corresponds to Sb–Te stretching modes. The Raman intensity at 121.5, 139 and 157 cm−1 in Ge20SbxTe80-x exhibits a non-monotonic dependence on Sb concentration, reaching a maximum at x = 2. A low- frequency boson peak (< 100 cm−1) observed in Sb40Te60 suggests a high density of low-energy vibrational states, characteristic of disordered structure.

Abstract Image

热蒸发制备GeTe4、Sb2Te3和Ge20SbxTe80-x非晶薄膜的制备及结构分析
制备了非晶Ge20Te80、Sb40Te60和Ge20SbxTe80-x (x = 1,2,5,10)化合物,并在高真空(10 - 5 Torr)下热蒸发沉积成40-80 nm的薄膜。利用x射线衍射、扫描电子显微镜和原子力显微镜对其结构特征进行了研究。利用空簇模型,从XRD谱图的第一个尖锐衍射峰出发,估计了密度波动的准周期(r)、相关长度(L)和堆积分数(L/r)。在Ge20Te80中,Sb部分取代Te导致L和L/r降低,表明结构无序性增加。拉曼光谱揭示了Ge20Te80和Sb40Te60中与短程有序相关的振动模式,有助于解释Ge20SbₓTe80ₓ薄膜。在Ge20Te80中,121.5和139 cm−1的拉曼优势峰归属于GeTe₄(n = 0,1)四面体,而154 ~ 159 cm−1和174 ~ 177 cm−1的拉曼优势峰对应于Te链和缺陷八面体单元。对于Sb40Te60薄膜,124.5和142 cm−1的峰归因于SbTe₃锥体单元中的Sb - te振动和扭曲的八面体Sb配位。在97和152 cm−1处的附加峰与Te-Te键有关,而在113.5 cm−1处的带对应于Sb-Te拉伸模式。Ge20SbxTe80-x在121.5、139和157 cm−1处的拉曼强度与Sb浓度呈非单调依赖关系,在x = 2处达到最大值。在Sb40Te60中观察到一个低频玻色子峰(< 100 cm−1),这表明它具有高密度的低能振动态,具有无序结构的特征。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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