Superhydrophobic Polysilicon Surface Induced by Stearic Acid-treated La(OH)3 Coating

IF 2.6 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Electronic Materials Letters Pub Date : 2025-05-07 DOI:10.1007/s13391-025-00576-6

Junseong Hur, Sangwoo Ryu

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Abstract

The growth and surface functionalization of silicon (Si) thin films have attracted significant attention for applications in microelectronics, photovoltaics, sensors, and actuators. Among various surface functionalities, hydrophobicity is critical in environments where contact with water-based liquids must be minimized. In this study, a 50 μm-thick polycrystalline Si film was deposited on a SiO₂/Si substrate using plasma-enhanced chemical vapor deposition (PECVD). X-ray diffraction revealed a strong (220) preferential orientation with a naturally textured surface morphology. Surface modification with stearic-acid-treated lanthanum hydroxide [SA-La(OH)₃] converted the initially hydrophilic Si surface to a hydrophobic state. When the treatment duration exceeded 12 h, the surface exhibited superhydrophobic behavior, with a water contact angle exceeding 150°. Furthermore, when applied to PET substrates commonly used in flexible electronics and photovoltaic backsheets, the SA-La(OH)₃ coating significantly reduced water vapor permeation by effectively repelling moisture. These results highlight the potential of SA-La(OH)₃ as a robust moisture barrier and a functional coating for hydrophobic surface engineering on Si-based devices.

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硬脂酸处理的La(OH)3涂层诱导的超疏水多晶硅表面

硅（Si）薄膜的生长和表面功能化在微电子、光伏、传感器和执行器等领域的应用引起了人们的极大关注。在各种表面功能中，疏水性在必须尽量减少与水基液体接触的环境中至关重要。本研究采用等离子体增强化学气相沉积（PECVD）技术在sio2 /Si衬底上沉积了一层50 μm厚的多晶Si薄膜。x射线衍射显示了强（220）优先取向和自然纹理表面形貌。用硬脂酸处理的氢氧化镧[SA-La（OH）₃]进行表面改性，将最初亲水的Si表面转化为疏水状态。当处理时间超过12 h时，表面表现出超疏水行为，水接触角超过150°。此外，当应用于柔性电子产品和光伏背板中常用的PET基板时，SA-La（OH）₃涂层通过有效地排斥水分，显着减少了水蒸气的渗透。这些结果突出了SA-La（OH）₃作为坚固的防潮层和硅基器件疏水表面工程的功能性涂层的潜力。

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来源期刊

Electronic Materials Letters 工程技术-材料科学：综合

CiteScore

4.70

自引率

20.80%

发文量

审稿时长

2.3 months

期刊介绍： Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.