Two-Step Photoelectron Lithography for Working with Fragile Nanostructures

IF 0.4 4区工程技术 Q4 ENGINEERING, MULTIDISCIPLINARY

Instruments and Experimental Techniques Pub Date : 2025-07-04 DOI:10.1134/S0020441225700393

S. G. Martanov, E. V. Tarkaeva, V. A. Ievleva, A. U. Kuntsevich

引用次数: 0

Abstract

An addition to an electron lithograph based on an optical microscope for fast patterning of large-scale elements by the method of contact mask photolithography in ultraviolet radiation on an electronic resistor is presented. The device accelerates the creation of contact pads for solid-state micro- and nanostructures and reduces the risk of sample loss when working with fragile structures.

Abstract Image

查看原文本刊更多论文

用于易碎纳米结构的两步光电子光刻技术

本文提出了一种基于光学显微镜的电子光刻机的补充，用于在电子电阻器上用接触掩模光刻方法在紫外辐射下快速制作大尺寸元件的图像化。该装置加速了固态微纳米结构接触垫的制造，并降低了处理脆弱结构时样品丢失的风险。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Instruments and Experimental Techniques 工程技术-工程：综合

CiteScore

1.20

自引率

33.30%

发文量

113

审稿时长

4-8 weeks

期刊介绍： Instruments and Experimental Techniques is an international peer reviewed journal that publishes reviews describing advanced methods for physical measurements and techniques and original articles that present techniques for physical measurements, principles of operation, design, methods of application, and analysis of the operation of physical instruments used in all fields of experimental physics and when conducting measurements using physical methods and instruments in astronomy, natural sciences, chemistry, biology, medicine, and ecology.