Yuanyuan Zuo , Shuai Yuan , Xuefeng Han , Xin Tian , Zhaoshuai Gao , Lingfeng Xu , Hengtao Ge , Peizhi Zhao , Hongfu Jiang , Jinrong Wang , Junfu Ni , Yu Gao , Jianwei Cao , Zhongshi Lou , Wei Sun , Deren Yang
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引用次数: 0
Abstract
Large-diameter Floating-zone (FZ) silicon, particularly 8-inch crystals, is essential for high-voltage devices like insulated gate bipolar transistors (IGBTs) and fast recovery diodes (FRDs), yet its production is hindered by low crystal growth yield due to ridge breakage defects. This study investigates inclusion-induced ridge breakage mechanisms in mass-produced 8-inch FZ silicon, using 8-inch (100) and 5-inch (111) crystals, with the latter employed to study bulk defect propagation. Through scanning electron microscopy, energy-dispersive spectroscopy, and mechanochemical polishing, we identified two mechanisms: surface-origin carbon inclusions, likely silicon carbide particles from graphite wear at the initial heating stage, induce twin formation, while bulk-origin microcrystalline silicon inclusions trigger dislocations and cracks. Numerical simulations revealed that central and edge high-stress zones amplify inclusion effects, with stress scaling linearly with diameter, exacerbating breakage in 8-inch crystals. A stress-inclusion interaction model explains how inclusions narrow the tolerable stress window. These findings advocate optimizing preform rod preparation and heating processes to minimize inclusions, enhancing yield for 8-inch FZ silicon in high-performance electronics.
期刊介绍:
Materialia is a multidisciplinary journal of materials science and engineering that publishes original peer-reviewed research articles. Articles in Materialia advance the understanding of the relationship between processing, structure, property, and function of materials.
Materialia publishes full-length research articles, review articles, and letters (short communications). In addition to receiving direct submissions, Materialia also accepts transfers from Acta Materialia, Inc. partner journals. Materialia offers authors the choice to publish on an open access model (with author fee), or on a subscription model (with no author fee).