Fabrication and Optical Characterization of Ultrathin Graphene Oxide Films Using a Combination Technique of Layer-by-Layer Coating Methods

IF 0.4 Q4 PHYSICS, CONDENSED MATTER
M. M. Saadeldin, Ahmed Samir, A. Guirguis
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Abstract

The synthesis of graphene and graphene oxide (GO) is critical for unlocking their vast potential across a range of practical applications. Among the various methods employed, graphite exfoliation emerges as one of the most straightforward techniques for producing these materials. However, achieving optimal synthesis conditions, preserving the pristine structure, minimizing layers and lateral size, and reducing oxygen content present significant challenges. In this study, we focus on fabricating uniform GO thin films utilizing the intrinsic self-alignment phenomenon between scattered nanosheets, achieved through the exfoliation technique without the need for catalysis or templates. This innovative approach harnesses the natural properties of GO materials, making them more suitable for industrial applications. The electrical and optical properties of the resulting GO thin films were thoroughly characterized using microscopy, spectroscopy, and ellipsometry techniques. By classifying GO bulk material based on its electronic properties, it can be categorized as a high-energy gap semiconducting material due to the presence of both sp3 and sp2 bonds, along with abundant oxygen functional groups in its matrix. This characteristic allows for the tuning of the energy gap by controlling the oxidation/reduction level. Our findings reveal that the GO thin film with eight layers (GO8) exhibited a superior self-alignment rate compared to other films, displaying fewer defects between GO nanosheets. This GO8 thin film displayed semiconducting behavior with a confined bandgap value of 2.26 eV, as determined through optical measurements. The observed self-alignment phenomenon among GO nanosheets holds promise for engineering these scattered nanosheets into more complex nanostructures, potentially enabling various applications across different fields. This study highlights the importance of understanding and harnessing inherent material properties for the development of advanced materials with tailored functionalities.

Abstract Image

超薄氧化石墨烯薄膜的制备与光学特性研究
石墨烯和氧化石墨烯(GO)的合成对于释放其在一系列实际应用中的巨大潜力至关重要。在采用的各种方法中,石墨剥离是生产这些材料的最直接的技术之一。然而,实现最佳合成条件、保持原始结构、最小化层数和横向尺寸以及降低氧含量都是一个重大挑战。在这项研究中,我们的重点是利用分散的纳米片之间固有的自对准现象,通过剥离技术实现均匀的氧化石墨烯薄膜,而不需要催化剂或模板。这种创新的方法利用氧化石墨烯材料的自然特性,使其更适合工业应用。利用显微镜、光谱学和椭偏技术对氧化石墨烯薄膜的电学和光学特性进行了全面表征。根据其电子性质对氧化石墨烯块体材料进行分类,由于其基体中同时存在sp3和sp2键,并且含有丰富的氧官能团,因此可以将其归类为高能隙半导体材料。这个特性允许通过控制氧化/还原水平来调整能量间隙。我们的研究结果表明,与其他薄膜相比,八层氧化石墨烯薄膜(GO8)具有更高的自对准率,氧化石墨烯纳米片之间的缺陷更少。通过光学测量,该GO8薄膜具有半导体特性,其禁带隙值为2.26 eV。观察到的氧化石墨烯纳米片之间的自对准现象为将这些分散的纳米片设计成更复杂的纳米结构提供了希望,有可能在不同领域实现各种应用。这项研究强调了理解和利用材料固有特性对于开发具有定制功能的先进材料的重要性。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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