Influence of Heat Treatment on Phase Segregation in Polymer-Containing CsPbBr2I Composite Films

IF 0.4 Q4 PHYSICS, CONDENSED MATTER
A. S. Toikka, R. Kenesbay, M. Baeva, D. M. Mitin, I. S. Mukhin
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Abstract

The influence of vacuuming and annealing temperatures on the properties of composite films based on CsPbBr2I perovskites was investigated. Partial substitution of Pb2+ ions with Mn2+ was employed, and grain boundaries were passivated using polyethylene oxide and polyvinylidene fluoride. Dimethyl sulfoxide was used as the solvent, and the films were prepared by spin-coating. The vacuuming and annealing temperatures were varied in the ranges of 60–80 and 60–90°C, respectively. Photoluminescence spectral dependences were compared to assess the effects of phase segregation and the applicability of the selected temperature conditions. It was found that the samples prepared at vacuuming and annealing temperatures of 70°C exhibited photoluminescence peaks at 616 ± 14 and 638 ± 18 nm, corresponding to CsPbBr2I. The presence of two peaks indicates slight phase segregation, which manifests as local variations in the stoichiometric composition of the samples, resulting in Br- and I-rich regions. Nevertheless, among the studied conditions, this thermal treatment regime is optimal in terms of suppressing photoinduced phase segregation: decreasing the temperature shifts the photoluminescence band toward shorter wavelengths while increasing it leads to the formation of defective nonluminescent phases.

Abstract Image

热处理对含聚合物CsPbBr2I复合膜相偏析的影响
研究了真空和退火温度对CsPbBr2I钙钛矿复合薄膜性能的影响。采用Mn2+部分取代Pb2+离子,并采用聚氧化物和聚偏氟乙烯钝化晶界。以二甲亚砜为溶剂,采用旋涂法制备薄膜。真空和退火温度分别为60 ~ 80℃和60 ~ 90℃。比较了光致发光光谱依赖性,以评估相偏析的影响和所选温度条件的适用性。在真空和70℃退火温度下制备的样品在616 ± 14和638 ± 18 nm处出现光致发光峰,与CsPbBr2I相对应。两个峰的存在表明存在轻微的相偏析,这表现为样品化学计量组成的局部变化,导致富Br和富i区。然而,在所研究的条件中,这种热处理方式在抑制光致相偏析方面是最佳的:降低温度会使光致发光带向短波长方向移动,而增加温度则会导致有缺陷的非发光相的形成。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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