D. D. Polyakov, A. V. Voronin, A. V. Nashchekin, A. A. Levin
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引用次数: 0
Abstract
The results of studying the morphology and structure of the “Tungsten Metal Powder” brand plates (Spetsmetallmaster Group of Companies (SMM GC)) used as protective tiles in the lower divertor of the Globus-M tokamak and subjected to additional processing with the hydrogen plasma of a coaxial accelerator from distances of 50 and 260 mm at 5, 10, and 20 irradiation cycles are described. The morphology and elemental composition of the surface of the plates are determined using scanning electron microscopy and energy-dispersive X-ray spectroscopy, respectively. The structure of the irradiated surface layer of the plates at an X-ray penetration depth of up to ~1.4 μm is analyzed on the basis of X-ray diffraction (XRD) data using Williamson–Hall profile analysis and size-strain plot methods adapted to take into account the observed pseudo-Voigt type of XRD reflections. The crystal structure of this layer is refined using the Rietveld method. The asymmetry of tungsten reflections after plasma treatment is described by simulation with two (for samples irradiated from a distance of 260 mm) and three (for a distance of 50 mm) crystalline phases of W with the same cubic symmetry, but with a slightly different unit cell parameter and different values of the mean crystallite size and absolute mean value of the microstrain in them.
本文描述了“钨金属粉末”牌板(Spetsmetallmaster Group of Companies (SMM GC))的形态和结构研究结果,该板用作Globus-M托卡马克下部导流器的保护瓦,并在同轴加速器的氢等离子体中进行了5、10和20次辐照循环,距离为50和260 mm。利用扫描电子显微镜和能量色散x射线光谱学分别测定了板材表面的形貌和元素组成。在x射线衍射(XRD)数据的基础上,采用Williamson-Hall剖面分析和尺寸-应变图方法,考虑了观察到的伪voigt型x射线反射,分析了x射线穿透深度达~1.4 μm时辐照层的结构。利用Rietveld方法对该层的晶体结构进行了细化。用两个(距离260 mm处)和三个(距离50 mm处)具有相同立方对称的W晶相,但其晶胞参数略有不同,晶胞平均尺寸和微应变的绝对平均值不同,通过模拟描述了等离子体处理后钨反射的不对称性。
期刊介绍:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.