Layer-Resolved Spin and Charge Interplay in H-, Ag-, and Au-Adsorbed Si(111) Surfaces: Insights into Metallicity and Magnetism

IF 3.3 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-06-24 DOI:10.1007/s12633-025-03370-z
Nasim Hassani
{"title":"Layer-Resolved Spin and Charge Interplay in H-, Ag-, and Au-Adsorbed Si(111) Surfaces: Insights into Metallicity and Magnetism","authors":"Nasim Hassani","doi":"10.1007/s12633-025-03370-z","DOIUrl":null,"url":null,"abstract":"<div><p>This study investigates the electronic and magnetic properties of H-, Ag-, and Au-adsorbed Si(111) surfaces across single-layer (1L), bilayer (2L), trilayer (3L), and four-layer (4L) configurations using density functional theory (DFT) calculations. We considered a new Si(111) configuration, which is semiconducting with a 1.19 eV band gap, slightly differing from its counterpart, the metallic Si(111). All H/Si(111) structures are semiconductors with a band gap in the range of 1.00 to 2.03 eV. Ag has a less pronounced effect on the semiconducting behavior, maintaining reduced band gaps, while Au induces metallicity and strong spin polarization, especially in 2L and 3L systems. The magnetic character in Au/Si(111) arises from significant contributions of <i>d</i>-orbitals, promoting electron delocalization and structural strain. These findings highlight a clear relationship between layer thickness and electronic properties, with increased stability in multilayer configurations. These results provide valuable insights into the interplay between metal adsorption and electronic structure, with promising implications for spintronic and catalytic applications.</p></div>","PeriodicalId":776,"journal":{"name":"Silicon","volume":"17 11","pages":"2635 - 2650"},"PeriodicalIF":3.3000,"publicationDate":"2025-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Silicon","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s12633-025-03370-z","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

Abstract

This study investigates the electronic and magnetic properties of H-, Ag-, and Au-adsorbed Si(111) surfaces across single-layer (1L), bilayer (2L), trilayer (3L), and four-layer (4L) configurations using density functional theory (DFT) calculations. We considered a new Si(111) configuration, which is semiconducting with a 1.19 eV band gap, slightly differing from its counterpart, the metallic Si(111). All H/Si(111) structures are semiconductors with a band gap in the range of 1.00 to 2.03 eV. Ag has a less pronounced effect on the semiconducting behavior, maintaining reduced band gaps, while Au induces metallicity and strong spin polarization, especially in 2L and 3L systems. The magnetic character in Au/Si(111) arises from significant contributions of d-orbitals, promoting electron delocalization and structural strain. These findings highlight a clear relationship between layer thickness and electronic properties, with increased stability in multilayer configurations. These results provide valuable insights into the interplay between metal adsorption and electronic structure, with promising implications for spintronic and catalytic applications.

层分辨自旋和电荷在H-, Ag-和au吸附Si(111)表面的相互作用:对金属丰度和磁性的见解
本研究利用密度泛函理论(DFT)计算研究了H-、Ag-和au吸附Si(111)表面在单层(1L)、双层(2L)、三层(3L)和四层(4L)结构中的电子和磁性能。我们考虑了一种新的Si(111)结构,它是半导体的,带隙为1.19 eV,与其对应的金属Si(111)略有不同。所有的H/Si(111)结构都是带隙在1.00 ~ 2.03 eV范围内的半导体。Ag对半导体行为的影响不太明显,保持了较小的带隙,而Au诱导金属丰度和强自旋极化,特别是在2L和3L体系中。Au/Si(111)的磁性特征是由于d轨道的显著贡献,促进了电子离域和结构应变。这些发现强调了层厚度和电子性能之间的明确关系,并增加了多层结构的稳定性。这些结果为金属吸附和电子结构之间的相互作用提供了有价值的见解,对自旋电子和催化应用具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信