High-performance triple-band ultraviolet photodetector based on mixed-phase InGaO thin film for material identification

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-09-25 DOI:10.1063/5.0281387

Yucheng Hou, Xiaobo She, Xiang Wang, Xiwu Huang, Lei Li, Yingxu Wang, Xupeng Yang, Jiaqing Yuan, Lingfei Li, Changtai Xia, Shan Li, Yufeng Guo, Weihua Tang, Yu Liu

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引用次数: 0

Abstract

The wavelength-dependent nature of material reflectance in the ultraviolet (UV) range makes multi-band UV response analysis an effective technique for material identification. In this work, a triple-band UV photodetector was constructed on the In2O3-Ga2O3 (InGaO) mixed-phase thin films. By incorporating In into Ga2O3 via plasma-enhanced chemical vapor deposition method, the bandgap of the mixed-phase InGaO thin films was modulated to 4.64 eV, extending the spectral response range to cover UVA (365 nm), UVB (295 nm), and UVC (255 nm) bands. This broadband photoresponse enables quantitative analysis of material-specific UV reflectance signatures, offering a reliable basis for material differentiation. Integrating a 5 × 4 photodetector array with convolutional neural networks, a precise identification and an accurate imaging of geometrically identical materials (Al, Ag, Si, and Au) were realized. For Al, Ag, and Si, this system achieves an overall accuracy exceeding 95%. This work proposes an efficient strategy for nondestructive surface inspection and material recognition by combining multi-spectral sensing with intelligent data processing.

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基于混相InGaO薄膜材料鉴别的高性能三波段紫外探测器

材料在紫外波段的反射率随波长变化，使得多波段紫外响应分析成为材料识别的有效技术。本文在In2O3-Ga2O3 （InGaO）混合相薄膜上构建了三波段紫外光电探测器。通过等离子体增强化学气相沉积法将In加入到Ga2O3中，将混合相InGaO薄膜的带隙调制到4.64 eV，将光谱响应范围扩展到UVA (365 nm), UVB （295 nm）和UVC （255 nm）波段。这种宽带光响应能够定量分析材料特定的紫外线反射特征，为材料区分提供可靠的基础。利用卷积神经网络集成5 × 4光电探测器阵列，实现了几何相同材料（Al, Ag， Si和Au）的精确识别和精确成像。对于Al， Ag和Si，该系统的总体精度超过95%。本文提出了一种将多光谱传感与智能数据处理相结合的高效无损表面检测和材料识别策略。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.