{"title":"Porous Lightweight Polyimide Films with Ultra-High Surface Insulation Strength and Thermal Insulation for Space Solar Arrays","authors":"Wen-Rui Li, , , Xiong Yang, , , Guang-Yu Sun*, , , Yu-Cheng Zhang, , , Hao-Yan Liu, , , Xiao-Gang Qin, , , Bai-Peng Song, , and , Guan-Jun Zhang*, ","doi":"10.1021/acsami.5c16114","DOIUrl":null,"url":null,"abstract":"<p >Improving the surface insulation strength of substrate material polyimide (PI) is an effective strategy to suppress charging and discharging effects of spacecraft solar arrays. To meet the insulation requirements of next-generation spacecraft with higher voltage levels, the surface insulation of PI must be further improved. Herein, we propose an approach to control the surface roughness and pore distribution of PI using a pore-forming agent. Modulating surface roughness and pore distribution effectively suppresses secondary electron emission avalanches, greatly enhancing surface insulation strength. When the pore-forming agent addition ratio is 50%, the film features the highest flashover threshold of 55.93 kV, a 201.7% improvement over the PI films currently used in spacecraft. The maximum secondary electron yield decreased from 2.01 to 1.32. Additionally, this novel porous PI film is exceptionally lightweight and possesses excellent electrical and thermal properties. The thermal equilibrium temperature is up to 13.44% lower than that of PI films currently used in spacecraft. Even after high- and low-temperature thermal shock, its mechanical properties and flashover performance remain highly stable. The novel polyimide films hold great potential for future applications in insulation of space solar arrays.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 40","pages":"56553–56562"},"PeriodicalIF":8.2000,"publicationDate":"2025-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsami.5c16114","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Improving the surface insulation strength of substrate material polyimide (PI) is an effective strategy to suppress charging and discharging effects of spacecraft solar arrays. To meet the insulation requirements of next-generation spacecraft with higher voltage levels, the surface insulation of PI must be further improved. Herein, we propose an approach to control the surface roughness and pore distribution of PI using a pore-forming agent. Modulating surface roughness and pore distribution effectively suppresses secondary electron emission avalanches, greatly enhancing surface insulation strength. When the pore-forming agent addition ratio is 50%, the film features the highest flashover threshold of 55.93 kV, a 201.7% improvement over the PI films currently used in spacecraft. The maximum secondary electron yield decreased from 2.01 to 1.32. Additionally, this novel porous PI film is exceptionally lightweight and possesses excellent electrical and thermal properties. The thermal equilibrium temperature is up to 13.44% lower than that of PI films currently used in spacecraft. Even after high- and low-temperature thermal shock, its mechanical properties and flashover performance remain highly stable. The novel polyimide films hold great potential for future applications in insulation of space solar arrays.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.