Thermal and optical performance of Ag+TiN–TiN–Al2O3 multilayer coatings for infrared camouflage in aerospace applications

IF 3 Q2 PHYSICS, CONDENSED MATTER

Micro and Nanostructures Pub Date : 2025-09-20 DOI:10.1016/j.micrna.2025.208359

Rohit Bharti , Mohammad Mursaleen , Abhijit Dey

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引用次数: 0

Abstract

Ag+TiN–TiN–Al₂O₃ multilayer coatings were deposited on Si (100) substrates using multi-target magnetron sputtering. The effects of vacuum annealing at 300 °C, 400 °C, and 500 °C were investigated in terms of structural, morphological, and optical properties, including infrared emissivity. XRD analysis showed improved crystallinity up to 400 °C, while partial degradation occurred at 500 °C. FESEM revealed grain coarsening and surface densification with increasing temperature. Optical reflectance increased with annealing, and the bandgap widened to a maximum of 2.30 eV at 400 °C, followed by narrowing at 500 °C due to defect formation. FTIR-based analysis indicated a minimum emissivity of 0.102 in the 3–5 μm range at 400 °C. The results demonstrate that 400 °C is the optimal annealing temperature for achieving low emissivity, high structural order, and stable optical performance, making the coatings suitable for infrared stealth and thermal management in aerospace applications.

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航空航天红外伪装用Ag+ TiN-TiN-Al2O3多层涂层的热光学性能

采用多靶磁控溅射技术在Si（100）衬底上沉积了Ag+ TiN-TiN-Al2O3多层涂层。研究了300℃、400℃和500℃真空退火对材料结构、形貌和光学性能（包括红外发射率）的影响。XRD分析表明，在400°C时结晶度得到改善，而在500°C时发生部分降解。FESEM显示，随着温度的升高，晶粒粗化，表面致密化。退火后，光反射率增加，禁带宽度在400℃时达到最大值2.30 eV， 500℃时由于缺陷的形成，禁带宽度逐渐收窄。基于ftir的分析表明，在400°C时，在3-5 μm范围内的最小发射率为0.102。结果表明，400°C是实现低发射率、高结构有序和稳定光学性能的最佳退火温度，使涂层适用于航空航天应用中的红外隐身和热管理。

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来源期刊

Micro and Nanostructures

CiteScore

6.50

自引率

0.00%

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