John G. Hylak, , , Thomas T. Tran, , , Andriy Zakutayev, , and , Harry A. Atwater*,
{"title":"Growth and Characterization of Epitaxial FeWO4 Thin Films with Controlled Oxygen Stoichiometry","authors":"John G. Hylak, , , Thomas T. Tran, , , Andriy Zakutayev, , and , Harry A. Atwater*, ","doi":"10.1021/acs.chemmater.4c03044","DOIUrl":null,"url":null,"abstract":"<p >We report the growth of single-phase epitaxial FeWO<sub>4</sub> thin films, using plasma-assisted molecular beam epitaxy, and investigate structural, optical, and electronic properties. The FeWO<sub>4</sub> films grow in (100) orientation on <i>c</i>-plane sapphire (0001) substrates and exhibit 3 rotational twin variants where FeWO<sub>4</sub> [001] is aligned to sapphire [100] equivalent in-plane directions. X-ray diffraction measurements indicate that the epitaxial FeWO<sub>4</sub> (100) structure is optimized when 80–100 W of rf power is applied to an atomic oxygen source during growth, yielding films with minimal strain and impurity phases or other orientations. In films grown with 120 W of rf power, FeWO<sub>4</sub> crystallites develop inhomogeneous and homogeneous strains and are potentially contaminated with Fe<sup>3+</sup> oxide phase impurities. In films grown with 60 W of rf power, FeWO<sub>4</sub> crystallites do not form fully epitaxial layers. X-ray photoelectron spectroscopy indicates that the structural changes are correlated with the Fe<sup>3+</sup>/Fe<sup>2+</sup> oxidation state ratio increasing from 0.6–1.4 with rf power from 60–120 W. X-ray fluorescence spectroscopy indicates that the Fe/W composition ratio is also increasing from 1.1–1.8 with rf power from 60–120 W. Ultraviolet and visible optical absorption spectra indicate a 1.8 ± 0.1 eV band gap with an additional interband absorption feature at 3.1 ± 0.1 eV in the 80–100 W films, with similar onsets observed in the 60 W films. In the 120 W films, the higher lying transition is shifted to 2.7 ± 0.1 eV due to the Fe<sup>3+</sup> enrichment. Electrical resistivity decreases over 2 orders of magnitude with oxidation from 10<sup>4</sup>–10<sup>5</sup> Ω cm in 60 W films to 120 ± 10 Ω cm in 120 W films. Thermopower measurements show p-type to n-type conductivity conversion when oxidation states shift from Fe<sup>2+</sup> majority in the 100 W films to Fe<sup>3+</sup> majority in the 120 W films. We conclude that electron polaron hopping driven by Fe<sup>3+</sup> is a dominant transport mechanism and a source of n-type conductivity in overoxidized FeWO<sub>4</sub> films.</p>","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":"37 18","pages":"6953–6961"},"PeriodicalIF":7.0000,"publicationDate":"2025-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemistry of Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acs.chemmater.4c03044","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
We report the growth of single-phase epitaxial FeWO4 thin films, using plasma-assisted molecular beam epitaxy, and investigate structural, optical, and electronic properties. The FeWO4 films grow in (100) orientation on c-plane sapphire (0001) substrates and exhibit 3 rotational twin variants where FeWO4 [001] is aligned to sapphire [100] equivalent in-plane directions. X-ray diffraction measurements indicate that the epitaxial FeWO4 (100) structure is optimized when 80–100 W of rf power is applied to an atomic oxygen source during growth, yielding films with minimal strain and impurity phases or other orientations. In films grown with 120 W of rf power, FeWO4 crystallites develop inhomogeneous and homogeneous strains and are potentially contaminated with Fe3+ oxide phase impurities. In films grown with 60 W of rf power, FeWO4 crystallites do not form fully epitaxial layers. X-ray photoelectron spectroscopy indicates that the structural changes are correlated with the Fe3+/Fe2+ oxidation state ratio increasing from 0.6–1.4 with rf power from 60–120 W. X-ray fluorescence spectroscopy indicates that the Fe/W composition ratio is also increasing from 1.1–1.8 with rf power from 60–120 W. Ultraviolet and visible optical absorption spectra indicate a 1.8 ± 0.1 eV band gap with an additional interband absorption feature at 3.1 ± 0.1 eV in the 80–100 W films, with similar onsets observed in the 60 W films. In the 120 W films, the higher lying transition is shifted to 2.7 ± 0.1 eV due to the Fe3+ enrichment. Electrical resistivity decreases over 2 orders of magnitude with oxidation from 104–105 Ω cm in 60 W films to 120 ± 10 Ω cm in 120 W films. Thermopower measurements show p-type to n-type conductivity conversion when oxidation states shift from Fe2+ majority in the 100 W films to Fe3+ majority in the 120 W films. We conclude that electron polaron hopping driven by Fe3+ is a dominant transport mechanism and a source of n-type conductivity in overoxidized FeWO4 films.
期刊介绍:
The journal Chemistry of Materials focuses on publishing original research at the intersection of materials science and chemistry. The studies published in the journal involve chemistry as a prominent component and explore topics such as the design, synthesis, characterization, processing, understanding, and application of functional or potentially functional materials. The journal covers various areas of interest, including inorganic and organic solid-state chemistry, nanomaterials, biomaterials, thin films and polymers, and composite/hybrid materials. The journal particularly seeks papers that highlight the creation or development of innovative materials with novel optical, electrical, magnetic, catalytic, or mechanical properties. It is essential that manuscripts on these topics have a primary focus on the chemistry of materials and represent a significant advancement compared to prior research. Before external reviews are sought, submitted manuscripts undergo a review process by a minimum of two editors to ensure their appropriateness for the journal and the presence of sufficient evidence of a significant advance that will be of broad interest to the materials chemistry community.