Peter C. Sherrell*, , , Kaspars Ma̅lnieks, , , Artu̅rs Plu̅dons, , , Andrea Merenda, , , Alexander Corletto, , , Kaiwen Zhang, , , Amy A. Gelmi, , , Dumindu G. Dassanayaka, , , James Bullock, , , Holger Fiedler, , and , Andris Šutka*,
{"title":"Tribovoltaic Energy Harvesting with ZnO Semiconductor–Metal Interfaces: The Role of an Al2O3 Tunnel Barrier Layer","authors":"Peter C. Sherrell*, , , Kaspars Ma̅lnieks, , , Artu̅rs Plu̅dons, , , Andrea Merenda, , , Alexander Corletto, , , Kaiwen Zhang, , , Amy A. Gelmi, , , Dumindu G. Dassanayaka, , , James Bullock, , , Holger Fiedler, , and , Andris Šutka*, ","doi":"10.1021/acsaelm.5c01027","DOIUrl":null,"url":null,"abstract":"<p >Harvesting low-grade motion to convert to electricity has emerged as a critical technology for powering autonomous electronic devices. In particular, the tribovoltaic effect arising from lateral friction across a semiconductor–metal interface has demonstrated great promise for low power devices, with the phenomenon producing large currents but quite low voltages. Zinc oxide (ZnO) is one of the most commonly studied electromechanical materials; however, to date, this semiconductor has been relatively unstudied for tribovoltaic devices. Herein, we demonstrate the fabrication and performance of thin films from ZnO prepared by atomic layer deposition correlated to film thickness and surface coating. The ZnO thin films demonstrate a tribovoltaic current of 0.8 nA in contact with an Au probe, corresponding to a current density of 21 A cm<sup>–2</sup>. The mechanism of the tribovoltaic effect in ZnO was probed by the addition of a 2 nm aluminum oxide layer, which blocks hole transport and acts as a tunnel barrier layer, reducing the theoretical amount of charge recombination and limiting induced (hot) electron transfer from metal to ZnO. This work provides a key report in the use of ZnO for the tribovoltaic effect, offering a pathway to engineering multilayered heterostructures for either preventing or enhancing tribovoltaic charging.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"7 18","pages":"8385–8392"},"PeriodicalIF":4.7000,"publicationDate":"2025-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.5c01027","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Harvesting low-grade motion to convert to electricity has emerged as a critical technology for powering autonomous electronic devices. In particular, the tribovoltaic effect arising from lateral friction across a semiconductor–metal interface has demonstrated great promise for low power devices, with the phenomenon producing large currents but quite low voltages. Zinc oxide (ZnO) is one of the most commonly studied electromechanical materials; however, to date, this semiconductor has been relatively unstudied for tribovoltaic devices. Herein, we demonstrate the fabrication and performance of thin films from ZnO prepared by atomic layer deposition correlated to film thickness and surface coating. The ZnO thin films demonstrate a tribovoltaic current of 0.8 nA in contact with an Au probe, corresponding to a current density of 21 A cm–2. The mechanism of the tribovoltaic effect in ZnO was probed by the addition of a 2 nm aluminum oxide layer, which blocks hole transport and acts as a tunnel barrier layer, reducing the theoretical amount of charge recombination and limiting induced (hot) electron transfer from metal to ZnO. This work provides a key report in the use of ZnO for the tribovoltaic effect, offering a pathway to engineering multilayered heterostructures for either preventing or enhancing tribovoltaic charging.
收集低阶运动转化为电能已经成为为自主电子设备供电的一项关键技术。特别是,由半导体-金属界面上的横向摩擦引起的摩擦伏打效应在低功率器件中显示出巨大的前景,这种现象产生大电流但相当低的电压。氧化锌(ZnO)是研究最多的机电材料之一;然而,到目前为止,这种半导体对于摩擦伏打器件的研究还相对较少。在此,我们证明了原子层沉积法制备ZnO薄膜的制备和性能与薄膜厚度和表面涂层的关系。ZnO薄膜与Au探针接触时的摩擦伏电流为0.8 nA,对应的电流密度为21 a cm-2。通过添加2 nm的氧化铝层来探索ZnO中摩擦伏效应的机制,该氧化铝层阻止空穴传输并充当隧道势垒层,减少了电荷复合的理论量,并限制了金属到ZnO的诱导(热)电子转移。这项工作为ZnO在摩擦伏效应中的应用提供了关键报告,为防止或增强摩擦伏充电的多层异质结构的工程设计提供了途径。
期刊介绍:
ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric.
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