Exploring the structural, electronic, and transport properties in thickness-dependent two-dimensional Ga2O3induced by native defects.

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
H Zeng, C Ma, L J Hu, Y R Xue, M Wu
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Abstract

Understanding the effects of native oxygen vacancy (VO) and gallium vacancy (VGa) in two-dimensional (2D) Ga2O3semiconductors is critical for optimizing device efficiency and developing innovative applications. In this work, the structural stability, electronic structure, carrier mobility and conductivity of thickness-dependent 2D Ga2O3induced by native VOand VGaare systematically studied. In Ga2O3VOconfiguration, the newly occupied mid-gap states primarily composed of O-2p, Ga-3p, and Ga-3d orbitals are formed, demonstrating a deep donor feature. The created impurity levels lower the bandgaps of monolayer, bilayer, and trilayer Ga2O3VOto 1.60, 1.64, and 1.53 eV, respectively. The electron mobility exhibits a high value up to ∼12 154.89 cm2V-1s-1in bilayer Ga2O3VO. Shallow acceptor states primarily composed of O-2p and Ga-3d orbitals are introduced for Ga2O3VGaconfiguration, suggesting the effective p-type doping behavior. The bandgaps of monolayer, bilayer, and trilayer Ga2O3VGaare of respectively 2.31, 1.90, and 1.84 eV, accompanying with the monotonous decreasing of hole mobilities from 261.46-85.75 cm2V-1s-1alongx-direction. Meanwhile, the thickness dependent n-type and p-type conductivities are endowed with the similar trends as those of carrier mobilities. Distinct dimensional induced band features and transport properties have been resolved in VOand VGacases. The high carrier mobility and strong anisotropic observed in vacancy-deficient 2D Ga2O3highlight the insights into defect engineering strategies for next-generation wide-bandgap semiconductors.

探索由天然缺陷引起的厚度依赖的二维ga2o3的结构、电子和输运性质。
了解二维(2D) Ga2O3半导体中原生氧空位(VO)和镓空位(VGa)的影响对于优化器件效率和开发创新应用至关重要。本文利用第一性原理计算、变形势(DP)和玻尔兹曼输运理论,系统地研究了由原生VO和VGa诱导的厚度依赖的2D Ga2O3的结构稳定性、电子结构、载流子迁移率和电导率。在Ga2O3VO构型中,新占据的中隙态主要由O-2p、Ga-3p和Ga-3d轨道组成,表现出深给体特征。所产生的杂质能级可以作为空穴补偿中心,将单层、双层和三层Ga2O3VO的带隙分别降低到1.60、1.64和1.53 eV。在双层Ga2O3VO中,电子迁移率最高可达~ 12154.89 cm2V + 1s + 1。在Ga2O3VGa结构中引入了主要由O-2p和Ga-3d轨道组成的浅层受体态,表明了有效的p型掺杂行为。单层、双层和三层Ga2O3VGa的带隙分别为2.31、1.90和1.84 eV,且空穴迁移率沿x方向从261.46 cm2V单调下降至85.75 cm2V。同时,随着层厚的增加,n型电导率和p型电导率分别升高和降低,并具有与载流子迁移率相似的趋势。在VO和VGa情况下解决了不同的尺寸诱导带特征和输运性质。我们对缺位2D Ga2O3的综合研究表明,缺位2D Ga2O3具有高载流子迁移率和强各向异性,这对提高基于Ga2O3的2D电子和光电子器件的性能具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nanotechnology
Nanotechnology 工程技术-材料科学:综合
CiteScore
7.10
自引率
5.70%
发文量
820
审稿时长
2.5 months
期刊介绍: The journal aims to publish papers at the forefront of nanoscale science and technology and especially those of an interdisciplinary nature. Here, nanotechnology is taken to include the ability to individually address, control, and modify structures, materials and devices with nanometre precision, and the synthesis of such structures into systems of micro- and macroscopic dimensions such as MEMS based devices. It encompasses the understanding of the fundamental physics, chemistry, biology and technology of nanometre-scale objects and how such objects can be used in the areas of computation, sensors, nanostructured materials and nano-biotechnology.
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