Complexation structure and thermodynamic analysis of uranium (VI)/neodymium (III) adsorption by ethylenediamine triacetic acid chelating resin: based on potentiometric titration

IF 1.6 3区化学 Q3 CHEMISTRY, ANALYTICAL

Journal of Radioanalytical and Nuclear Chemistry Pub Date : 2025-07-31 DOI:10.1007/s10967-025-10288-8

Zhi Li, Shenghui Huang, Yan Shen, Yonggang Zhao, Zhiyuan Chang, Yan Chen, Yan Zhang, Tongxing Wang, Shengjie Yu, Chen Wang, Guoxin Tian

引用次数: 0

Abstract

This study explores the coordination of Ethylenediamine Triacetic Acid chelating resin with U(VI)/Nd(III) via potentiometric titration, determining the protonation constants of H₃L and stability constants of H₃L—U(VI)/Nd(III) complexes. Batch experiments confirm complexes like UO₂HL, UO₂L⁻, UO₂(OH)L²⁻, NdHL⁺, and NdL. Fixed H₃L differs from free H₃L; adjacent carboxylic groups may form hydrogen bonds, enhancing lgβ₃. H₃L forms a tridentate coordination with U(VI). The competitive adsorption of U(VI) and Nd(III) within a pH range is calculated and verified. Additionally, U(VI) adsorption in the presence of citric acid is calculated, supporting practical applications.

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乙二胺三乙酸螯合树脂吸附铀(VI)/钕（III）的络合结构及热力学分析：基于电位滴定法

采用电位滴定法研究了乙二胺三乙酸螯合树脂与U(VI)/Nd（III）的配位，确定了H₃L的质子化常数和H₃L - U(VI)/Nd（III）配合物的稳定性常数。批量实验证实了UO₂HL、UO₂L⁻、UO₂（OH）L2⁻、NdHL⁺和NdL等络合物。固定H₃L不同于自由H₃L；相邻的羧基可以形成氢键，增强lgβ₃。H₃L与U（VI）形成一个三叉配位。计算并验证了U（VI）和Nd（III）在一定pH范围内的竞争吸附。此外，计算了在柠檬酸存在下的U（VI）吸附量，支持实际应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Radioanalytical and Nuclear Chemistry 化学-分析化学

CiteScore

2.80

自引率

18.80%

发文量

504

审稿时长

2.2 months

期刊介绍： An international periodical publishing original papers, letters, review papers and short communications on nuclear chemistry. The subjects covered include: Nuclear chemistry, Radiochemistry, Radiation chemistry, Radiobiological chemistry, Environmental radiochemistry, Production and control of radioisotopes and labelled compounds, Nuclear power plant chemistry, Nuclear fuel chemistry, Radioanalytical chemistry, Radiation detection and measurement, Nuclear instrumentation and automation, etc.