Fabrication of molecular nanoscale junctions with a junction area of 7 × 7 nm2 and their structural and electrical properties

IF 4.1 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Mizuki Matsuzaka, Ryunosuke Miyamoto, Zijing Zhang, Kenta Sato, Hideo Kaiju
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引用次数: 0

Abstract

Molecular electronics has received considerable attention because molecular devices can provide several unique properties, such as giant magnetoresistance, a large Seebeck effect, and nonvolatile switching properties. These unique properties, including enhanced performances, have been observed in molecular nanoscale devices. Therefore, the miniaturization of molecular devices is a key issue for their practical use as well as for the development of fundamental science. In a previous study, we proposed a new nanojunction fabrication method using thin-film edges and successfully fabricated Ni78Fe22/2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT)/Ni78Fe22 nanojunctions with a junction area of 42 × 42 nm2. In this study, toward the realization of a smaller junction area, we fabricate Ni78Fe22/C8-BTBT/Ni78Fe22 nanojunctions using our advanced method. As electrodes in our nanojunctions, 7-nm-thick Ni78Fe22 thin films sandwiched between low-softening-point glasses can be fabricated using the thermal pressing technique. The area of the nanojunctions is determined from the thickness of the Ni78Fe22 thin film. Using these electrodes, we have successfully fabricated Ni78Fe22/C8-BTBT/Ni78Fe22 nanojunctions with a junction area of 7 × 7 nm2, which is the minimum value ever reported for edge-to-edge nanodevices, and observed electrical conduction through C8-BTBT molecules in the devices. Our study provides a novel nanofabrication technique and opens new opportunities for research in molecular nanoelectronics.

结面积为7 × 7 nm2的分子纳米级结的制备及其结构和电学性能
分子电子学受到了相当大的关注,因为分子器件可以提供一些独特的特性,如巨磁阻、大塞贝克效应和非易失性开关特性。这些独特的性质,包括增强的性能,已经在分子纳米级器件中观察到。因此,分子器件的小型化是其实际应用和基础科学发展的关键问题。在之前的研究中,我们提出了一种利用薄膜边缘制备纳米结的新方法,并成功制备了Ni78Fe22/2,7-二辛基[1]苯并噻吩[3,2-b][1]苯并噻吩(C8-BTBT)/Ni78Fe22纳米结,结面积为42 × 42 nm2。在本研究中,为了实现更小的结面积,我们使用我们的先进方法制备了Ni78Fe22/C8-BTBT/Ni78Fe22纳米结。在我们的纳米结中,可以使用热压技术制作夹在低软化点玻璃之间的7纳米厚的Ni78Fe22薄膜作为电极。纳米结的面积由Ni78Fe22薄膜的厚度决定。利用这些电极,我们成功地制备了结面积为7 × 7 nm2的Ni78Fe22/C8-BTBT/Ni78Fe22纳米结,这是迄今为止报道的最小边对边纳米器件的结面积,并观察了器件中C8-BTBT分子的导电情况。我们的研究提供了一种新的纳米制造技术,并为分子纳米电子学的研究开辟了新的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nanoscale Research Letters
Nanoscale Research Letters 工程技术-材料科学:综合
CiteScore
11.30
自引率
0.00%
发文量
110
审稿时长
48 days
期刊介绍: Nanoscale Research Letters (NRL) provides an interdisciplinary forum for communication of scientific and technological advances in the creation and use of objects at the nanometer scale. NRL is the first nanotechnology journal from a major publisher to be published with Open Access.
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