A coincidence ion beam analysis methodology for high resolution depth profiling of nickel using a resonance in the 58Ni(p, γ)59Cu reaction

IF 1.6 3区 化学 Q3 CHEMISTRY, ANALYTICAL
A. A. Sukumar, D. V. Lakshmipathy, Y. Sunitha, Sk Jayabun, J. V. Ramana, G. L. N. Reddy
{"title":"A coincidence ion beam analysis methodology for high resolution depth profiling of nickel using a resonance in the 58Ni(p, γ)59Cu reaction","authors":"A. A. Sukumar,&nbsp;D. V. Lakshmipathy,&nbsp;Y. Sunitha,&nbsp;Sk Jayabun,&nbsp;J. V. Ramana,&nbsp;G. L. N. Reddy","doi":"10.1007/s10967-025-10304-x","DOIUrl":null,"url":null,"abstract":"<div><p>A coincidence mode Ion Beam Analysis (CIBA) methodology has been standardised for the depth profiling of nickel. The methodology is unique, as the 1424 keV resonance in the <sup>58</sup>Ni(p, <i>γ</i>)<sup>59</sup>Cu reaction was utilised for interference free determination and depth profiling of nickel, using four channel high-speed digitizer, in coincidence spectroscopy mode (CI-NRRA). The aforementioned reaction, with a <i>Q</i> value of 3.42 MeV, emits characteristic <i>γ</i>-rays of 4817.7 keV, 4326.6 keV, and 491.1 keV energy. The 4326.6 keV, 491.1 keV <i>γ</i> -rays, emitted concomitantly, in the two-step cascade transition of the 4817.7 keV excited state, were detected in coincidence mode. Angular correlation studies were carried out to maximize coincidence events. Nickel depth profiling was carried out in Ni/Si, Cr/Ni/Si, Nb-W-Ta/Ni/Si films and Ni bulk targets. CI-NRRA facilitated the removal of interferences from chromium (Cr) and silicon (Si). The present study, which enables high resolution depth profile of Ni in various substrates, is the first of its kind to carry out Nuclear Resonance Reaction Analysis (NRRA) in coincidence mode for the depth profiling.</p></div>","PeriodicalId":661,"journal":{"name":"Journal of Radioanalytical and Nuclear Chemistry","volume":"334 8","pages":"5589 - 5599"},"PeriodicalIF":1.6000,"publicationDate":"2025-08-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s10967-025-10304-x.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Radioanalytical and Nuclear Chemistry","FirstCategoryId":"92","ListUrlMain":"https://link.springer.com/article/10.1007/s10967-025-10304-x","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
引用次数: 0

Abstract

A coincidence mode Ion Beam Analysis (CIBA) methodology has been standardised for the depth profiling of nickel. The methodology is unique, as the 1424 keV resonance in the 58Ni(p, γ)59Cu reaction was utilised for interference free determination and depth profiling of nickel, using four channel high-speed digitizer, in coincidence spectroscopy mode (CI-NRRA). The aforementioned reaction, with a Q value of 3.42 MeV, emits characteristic γ-rays of 4817.7 keV, 4326.6 keV, and 491.1 keV energy. The 4326.6 keV, 491.1 keV γ -rays, emitted concomitantly, in the two-step cascade transition of the 4817.7 keV excited state, were detected in coincidence mode. Angular correlation studies were carried out to maximize coincidence events. Nickel depth profiling was carried out in Ni/Si, Cr/Ni/Si, Nb-W-Ta/Ni/Si films and Ni bulk targets. CI-NRRA facilitated the removal of interferences from chromium (Cr) and silicon (Si). The present study, which enables high resolution depth profile of Ni in various substrates, is the first of its kind to carry out Nuclear Resonance Reaction Analysis (NRRA) in coincidence mode for the depth profiling.

基于58Ni(p, γ)59Cu反应共振的符合离子束分析方法对镍进行高分辨率深度分析
符合模式离子束分析(CIBA)方法已被标准化用于镍的深度剖面分析。该方法是独特的,因为58Ni(p, γ)59Cu反应中的1424 keV共振被用于无干扰测定和镍的深度剖面,使用四通道高速数字化仪,在符合光谱模式(CI-NRRA)下。上述反应的Q值为3.42 MeV,发射的特征γ射线能量分别为4817.7 keV、4326.6 keV和491.1 keV。在4817.7 keV激发态的两步级联跃迁中,同时发射的4326.6 keV和491.1 keV γ射线以符合模式被检测到。进行角相关研究以最大化巧合事件。在Ni/Si、Cr/Ni/Si、Nb-W-Ta/Ni/Si薄膜和Ni大块靶材中进行镍深度剖面分析。CI-NRRA有助于去除铬(Cr)和硅(Si)的干扰。本研究首次在符合模式下对深度剖面进行核共振反应分析(NRRA),实现了不同基底中Ni的高分辨率深度剖面。
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来源期刊
CiteScore
2.80
自引率
18.80%
发文量
504
审稿时长
2.2 months
期刊介绍: An international periodical publishing original papers, letters, review papers and short communications on nuclear chemistry. The subjects covered include: Nuclear chemistry, Radiochemistry, Radiation chemistry, Radiobiological chemistry, Environmental radiochemistry, Production and control of radioisotopes and labelled compounds, Nuclear power plant chemistry, Nuclear fuel chemistry, Radioanalytical chemistry, Radiation detection and measurement, Nuclear instrumentation and automation, etc.
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