Yuzhu Liu;Shiwei Zhao;Pengfei Zhai;Teng Zhang;Yu Dong;Jie Liu
{"title":"Heavy-Ion Effects in SiC Power MOSFETs With Different Gate Oxide Thicknesses","authors":"Yuzhu Liu;Shiwei Zhao;Pengfei Zhai;Teng Zhang;Yu Dong;Jie Liu","doi":"10.1109/TNS.2025.3593241","DOIUrl":null,"url":null,"abstract":"Heavy-ion-induced single-event leakage current (SELC) in silicon carbide (SiC) power MOSFETs is investigated. Our experimental data for 1200 V SiC power MOSFETs with varying gate oxide thicknesses reveal that a thicker oxide reduces SELC in the drain–gate path but increases SELC in the drain–source path, suggesting a redistribution of damage in the device. Based on these experimental results, we propose the Lightning Leader model. This model suggests that a conductive path formed by heavy-ion passing through the gate oxide diverts current flow from the source to the low-resistance path in the gate, thereby mitigating damage to the source p–n junction region and altering the overall damage distribution in the SiC power MOSFET. Besides, we also discuss the SELC step extraction method as well as the impact of micro-dose effect and its annealing behavior.","PeriodicalId":13406,"journal":{"name":"IEEE Transactions on Nuclear Science","volume":"72 9","pages":"3033-3043"},"PeriodicalIF":1.9000,"publicationDate":"2025-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Nuclear Science","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11098808/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Heavy-ion-induced single-event leakage current (SELC) in silicon carbide (SiC) power MOSFETs is investigated. Our experimental data for 1200 V SiC power MOSFETs with varying gate oxide thicknesses reveal that a thicker oxide reduces SELC in the drain–gate path but increases SELC in the drain–source path, suggesting a redistribution of damage in the device. Based on these experimental results, we propose the Lightning Leader model. This model suggests that a conductive path formed by heavy-ion passing through the gate oxide diverts current flow from the source to the low-resistance path in the gate, thereby mitigating damage to the source p–n junction region and altering the overall damage distribution in the SiC power MOSFET. Besides, we also discuss the SELC step extraction method as well as the impact of micro-dose effect and its annealing behavior.
研究了碳化硅功率mosfet中重离子感应的单事件漏电流(SELC)。我们对具有不同栅氧化层厚度的1200 V SiC功率mosfet的实验数据表明,较厚的氧化物降低了漏极-栅极路径中的SELC,但增加了漏极-源极路径中的SELC,这表明器件中的损伤重新分布。基于这些实验结果,我们提出了闪电先锋模型。该模型表明,重离子通过栅极氧化物形成的导电路径将电流从源转移到栅极中的低阻路径,从而减轻了源p-n结区域的损伤,并改变了SiC功率MOSFET中的整体损伤分布。此外,我们还讨论了SELC步进萃取方法以及微剂量效应的影响及其退火行为。
期刊介绍:
The IEEE Transactions on Nuclear Science is a publication of the IEEE Nuclear and Plasma Sciences Society. It is viewed as the primary source of technical information in many of the areas it covers. As judged by JCR impact factor, TNS consistently ranks in the top five journals in the category of Nuclear Science & Technology. It has one of the higher immediacy indices, indicating that the information it publishes is viewed as timely, and has a relatively long citation half-life, indicating that the published information also is viewed as valuable for a number of years.
The IEEE Transactions on Nuclear Science is published bimonthly. Its scope includes all aspects of the theory and application of nuclear science and engineering. It focuses on instrumentation for the detection and measurement of ionizing radiation; particle accelerators and their controls; nuclear medicine and its application; effects of radiation on materials, components, and systems; reactor instrumentation and controls; and measurement of radiation in space.