Optical Properties and Radiation Stability of Polymethylphenylsiloxane Varnish Modified with SiO2 Nanoparticles

IF 3.3 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-07-16 DOI:10.1007/s12633-025-03399-0
Mikhail M. Mikhailov, Vladimir A. Goronchko, Alexey N. Lapin, Semyon A. Yuryev, Dmitriy S. Fedosov
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Abstract

The article is focused on examining the optical properties of the polymer binder based on polymethylphenylsiloxane varnish. The varnish was modified with SiO2 nanoparticles of various concentrations. The diffuse reflectance and transmittance spectra within 200 to 2500 nm were measured in vacuum (2·10–6 Torr) before and after irradiation with accelerated electrons (in situ, E = 30 keV, F = 2·1016 cm−2). Additionally, solar absorptance was calculated and the shift in the optical absorption edge was established. The post-modification increase in reflectance has been recorded in the UV and visible regions. In the near-IR region, the reflectance coefficient was found to increase or decrease in accordance with the nanoparticles’ concentration. The irradiation of the varnish samples with electrons leads to the formation of the absorption band within 200 to 600 nm. The nanoparticle-based modification leads to the decrease in the intensity of the induced absorption band. The nanoparticle concentration values suitable for the varnish radiation stability were established. Additionally, it was confirmed that the modification of varnish with SiO2 nanoparticles provides 1.6 fold increase in its radiation stability when exposed to radiation.

纳米SiO2修饰聚甲基苯基硅氧烷清漆的光学性能和辐射稳定性
本文主要研究了聚甲基苯基硅氧烷清漆聚合物粘结剂的光学性能。用不同浓度的SiO2纳米颗粒对清漆进行改性。在真空(2·10-6 Torr)中测量了加速电子(E = 30 keV, F = 2·1016 cm−2)辐照前后200 ~ 2500 nm范围内的漫反射光谱和透射光谱。此外,计算了太阳吸收率,建立了光学吸收边的位移。在紫外区和可见光区记录了改性后反射率的增加。在近红外区,反射系数随纳米粒子浓度的增大或减小。用电子照射清漆样品可形成200 ~ 600 nm范围内的吸收带。纳米粒子基改性导致诱导吸收带强度降低。确定了适合清漆辐射稳定性的纳米粒子浓度。此外,还证实了用SiO2纳米粒子修饰的清漆在暴露于辐射时的辐射稳定性提高了1.6倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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