Patterning Halide Perovskite Monocrystalline Arrays via Dry Imprinting Transfer

Abstract

Epitaxy of perovskite single crystals (SCs) has gained development, rendering large-area monocrystalline films with decent quality and high uniformity, while its patterning technologies have fallen behind due to materials degradation and contamination when processing, limiting the achievement of perovskite SC arrays and pixelization on a large scale. Here, we report a patterning method that utilizes a rigid stamper with designed geometries to mechanically punch freestanding perovskite films into SC arrays, leading to the dry patterning of perovskite SCs with high uniformity and intrinsic properties. Furthermore, arrays of complex configurations could be integrated via van der Waals (vdW) lamination, building up full-color pixel and vertical heterostructure. Based on this, we fabricated 3 × 3 photodetector arrays, with all devices exhibiting a similar responsivity of 0.5–2.6 A/W, a detectivity of 0.3–4 × 10¹¹ Jones and a fast response time of sub-20 ms. This damage- and residue-free dry imprinting transfer approach not only establishes a simple and rapid method for patterning perovskite SC arrays on a large scale, which is important for high-performance photodetectors and other optoelectronics, but also demonstrates potential for the integration of optoelectronics based on delicate semiconductors including organic thin films, 2D magnetic crystals, as well as their vdW heterostructures that are not compatible with conventional patterning techniques following the lithography-etching routine.