Front Cover: Deposition of Tin Catalysts from Thiolated Precursor Organic Solutions for CO2 Reduction to Formate: A Potential-Dependent Mechanism Study (ChemPlusChem 9/2025)
Yaron S. Cohen, Sumesh Sadhujan, Sonal Rajput, Yakov Shitrit, Olga Iliashevsky
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Abstract
The Front Cover reflects a potential-controlled deposition process of tin catalysts from organic solutions of a tin thiolated precursor, aiming to deposit on carbon-based substrates, for CO2 electro-catalyzed reduction to formate. Electrochemical and structure tools are enrolled to investigate the complex deposition mechanism, exposing irregular current-potential and mass change phenomena. Disproportionation and comproportionation reactions of tin are entitled to untie the redox behavior enigma. More information can be found in the Research Article by Yaron S. Cohen and co-workers (DOI: 10.1002/cplu.202500208).
前盖反映了锡硫化前驱体的有机溶液中锡催化剂的电位控制沉积过程，旨在沉积在碳基衬底上，用于二氧化碳电催化还原生成甲酸盐。利用电化学和结构工具研究了复杂的沉积机理，揭示了不规则的电流-电位和质量变化现象。锡的歧化反应和比例反应有助于解开锡的氧化还原行为之谜。更多信息可以在Yaron S. Cohen及其同事的研究文章中找到（DOI: 10.1002/cplu.202500208）。
期刊介绍：
ChemPlusChem is a peer-reviewed, general chemistry journal that brings readers the very best in multidisciplinary research centering on chemistry. It is published on behalf of Chemistry Europe, an association of 16 European chemical societies.
Fully comprehensive in its scope, ChemPlusChem publishes articles covering new results from at least two different aspects (subfields) of chemistry or one of chemistry and one of another scientific discipline (one chemistry topic plus another one, hence the title ChemPlusChem). All suitable submissions undergo balanced peer review by experts in the field to ensure the highest quality, originality, relevance, significance, and validity.
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