Charge transport generation-recombination mechanism in MoS2 based Schottky diodes

IF 4 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Ali Hajjiah, Aliaa Hajiah
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引用次数: 0

Abstract

The introduction of MoS₂, a two-dimensional transition metal dichalcogenide (TMD), provides unique electronic properties, including a tunable bandgap and high carrier mobility which makes it a promising material for optoelectronic applications. Here, the carrier transport in a Schottky Diode with a sandwiched structure of Pt electrode, n-type MoS₂ and Cr electrode has been investigated. Understanding the charge transport dynamics at Pt/MoS₂ junction of the diode is crucial for optimizing their performance in photodetectors and solar cell applications. The current–voltage (I-V) characteristics of the diode are quantitatively interpreted using the Sah–Noyce–Shockley theory, which describes generation-recombination mechanisms in the space-charge region for a fully depleted layer. The charge transport mechanisms in the Pt/MoS₂/Cr Schottky diode are dominated by recombination processes within the depletion width. The ideality factor remains nearly constant at n = 1.15 across different voltage ranges, challenging conventional thermionic emission models. The Schottky barrier height at the Pt/MoS₂ interface exhibit a built-in voltage dependence. The I–V characteristics are significantly influenced by the optimum bulk properties: mid-gap defect level (Eₜ = 0.75 eV), barrier height (φ₀=0.55 eV), and carrier lifetimes (τₙ = τₚ = 1.5 × 10⁻¹⁰ s). Increased ideality factor (n = 1.2–1.8) reflects an impeded charge transport or increased recombination due to defects and leakage current.

二硫化钼基肖特基二极管的电荷输运-复合机制
MoS 2是一种二维过渡金属二硫化物(TMD),它提供了独特的电子特性,包括可调的带隙和高载流子迁移率,使其成为光电子应用的有前途的材料。本文研究了由Pt电极、n型MoS 2和Cr电极组成的肖特基二极管的载流子输运。了解二极管Pt/MoS结的电荷输运动力学对于优化其在光电探测器和太阳能电池应用中的性能至关重要。使用Sah-Noyce-Shockley理论定量解释了二极管的电流-电压(I-V)特性,该理论描述了完全耗尽层的空间电荷区域的产生-重组机制。Pt/MoS 2 /Cr肖特基二极管中的电荷输运机制主要受耗尽宽度内的复合过程支配。在不同电压范围内,理想因子n = 1.15几乎保持不变,这对传统的热离子发射模型提出了挑战。Pt/MoS 2界面处的肖特基势垒高度表现出内置的电压依赖性。I-V特性受到最佳体性质的显著影响:中隙缺陷水平(E′l = 0.75 eV),势垒高度(φ 0 =0.55 eV)和载流子寿命(τ′r = τₚ= 1.5 × 10⁻¹⁰s)。理想因子(n = 1.2-1.8)的增加反映了电荷传输受阻或由于缺陷和漏电流而增加的复合。
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来源期刊
Optical and Quantum Electronics
Optical and Quantum Electronics 工程技术-工程:电子与电气
CiteScore
4.60
自引率
20.00%
发文量
810
审稿时长
3.8 months
期刊介绍: Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest. Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.
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